Daniel J Riggs

US Patent:

8254420, Aug 28, 2012

Filed:

Nov 18, 2009

Appl. No.:

12/620967

Inventors:

Daniel J. Riggs - San Diego CA, US
Olav Haugan - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/10

US Classification:

372 2902, 372 20, 372 19, 372 32, 372 3801, 372101, 372107, 372 98, 372 99, 372100, 372 55, 372 57

Abstract:

Laser light wavelength control is provided by periodically predicting a next position of a light controlling prism using a model of the prism's motion characteristics. The prediction is then updated if a measurement of laser output wavelength is obtained. However, because the predictions are made without waiting for a measurement, they can be made more frequently than the laser firing repetition rate and the prism can be repositioned at discrete points in time which can occur more frequently than the laser firing events. This also reduces performance degradation which may be caused by being one pulse behind a laser measurement and the resultant laser control signal being applied.

US Patent:

8411720, Apr 2, 2013

Filed:

Jun 30, 2011

Appl. No.:

13/174640

Inventors:

Kevin Michael O'Brien - San Diego CA, US
Joshua Jon Thornes - San Diego CA, US
Daniel Jason Riggs - San Diego CA, US
Rui Jiang - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/22

US Classification:

372 55, 372 56, 372 57, 372 58, 372 60

Abstract:

A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.

US Patent:

8598552, Dec 3, 2013

Filed:

Jul 13, 2012

Appl. No.:

13/549261

Inventors:

Paul Frihauf - La Jolla CA, US
Daniel J. Riggs - San Diego CA, US
Matthew R. Graham - San Diego CA, US
Steven Chang - San Diego CA, US
Wayne J. Dunstan - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H05G 2/00
H01L 21/027
G03F 7/20

US Classification:

250504R, 355 71, 355 75

Abstract:

Energy output from a laser-produced plasma (LPP) extreme ultraviolet light (EUV) system varies based on how well the laser beam can maintain focus on a target material to generate the plasma that gives off light. The system and method described herein optimize EUV light generation by using a closed-loop gradient process to track and fine-tune in real-time the positioning of optical elements that determine how the laser beam is focused on the target material. When real-time alignment of the drive laser on droplet position is achieved, EUV generation is optimized.

US Patent:

20080205472, Aug 28, 2008

Filed:

Apr 25, 2007

Appl. No.:

11/796065

Inventors:

Wayne J. Dunstan - San Diego CA, US
Kevin M. O'Brien - San Diego CA, US
Robert N. Jacques - San Diego CA, US
Herve A. Besaucele - San Diego CA, US
Daniel J. Riggs - San Diego CA, US
Aravind Ratnam - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/22

US Classification:

372 59

Abstract:

A method and apparatus are disclosed which may comprise predicting the gas lifetime for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas may comprise: utilizing at least one of a plurality of laser operating input and/or output parameters; utilizing a set of at least one parameter of utilization in the photolithography process to determine a gas use model in relation to the respective input or output parameter; predicting the end of gas life based upon the model and a measurement of the respective input or output parameter. The parameter may comprise a pulse utilization pattern. The method and apparatus may comprise performing gas management for a gas discharge laser light source for a photolithography process, the light source comprising a halogen containing lasing gas comprising: utilizing periodic and frequent partial gas refills comprising an inject comprising a mixture of halogen gas and bulk gas in generally the same ration as the premix ratio provided to the laser in a full gas refill, and in an amount less than two percent of the total gas pressure prior to the injection.

US Patent:

20120275481, Nov 1, 2012

Filed:

Apr 29, 2011

Appl. No.:

13/098259

Inventors:

Daniel J. Riggs - San Diego CA, US

International Classification:

H01S 3/22

US Classification:

372 59

Abstract:

Methods and systems for controlling the gas concentrations in the chambers of a two chamber gas discharge laser such as an excimer laser are disclosed. A first set of inject opportunities is selected for the laser chamber of the master oscillator, and a second set of inject opportunities is selected for the laser chamber of the power amplifier. At each selected inject opportunity for the master oscillator, its laser chamber receives an inject containing a fixed amount of a non-halogen containing gas, and a calculated amount of a halogen containing gas. At the selected inject opportunities for the power amplifier, its laser chamber receives a fixed amount of the halogen containing gas, and may also receive a fixed amount of the non-halogen containing gas.

US Patent:

20130000773, Jan 3, 2013

Filed:

Jun 30, 2011

Appl. No.:

13/174484

Inventors:

Rui Jiang - San Diego CA, US
Joshua Jon Thornes - San Diego CA, US
Daniel Jason Riggs - San Diego CA, US
Kevin Michael O'Brien - San Diego CA, US

Assignee:

CYMER, INC. - San Diego CA

International Classification:

B65B 31/04

US Classification:

141 8, 141 65

Abstract:

Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.

US Patent:

20130083818, Apr 4, 2013

Filed:

Sep 30, 2011

Appl. No.:

13/251181

Inventors:

Daniel J. Riggs - San Diego CA, US

Assignee:

CYMER, INC. - San Diego CA

International Classification:

H01S 3/22

US Classification:

372 59

Abstract:

Systems and methods for automatically performing a high accuracy gas inject in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. A mathematical model relates the amount of halogen gas in the laser chamber after an inject to the amount of halogen gas present prior to the inject, the amount of halogen gas injected, and the consumption rate of halogen gas in the chamber. A fixed amount of halogen gas is added to the chamber in an initial number of injects to allow transients to settle out, after which the amount of halogen gas to be injected is that calculated to result in a desired amount of halogen gas after the inject according to the model. Measurements are taken after injects to update the actual amount of halogen gas present and the consumption rate of the halogen gas.

US Patent:

20130170516, Jul 4, 2013

Filed:

Dec 28, 2011

Appl. No.:

13/338580

Inventors:

Daniel J. Riggs - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/223

US Classification:

372 58

Abstract:

A method and system for performing injects of halogen gas into the chambers of a two chamber gas discharge laser such as a MOPA excimer laser for allowing operation of the laser within acceptable parameters and compensating for ageing effects without the necessity of performing refills is described. A parameter reflecting efficiency of the laser is measured, and the change in the parameter with respect to the length of laser operation is estimated. The change in the parameter with respect to the pressure in one of the chambers is also measured. At a given time, the total change in the value of the parameter is estimated, and from this change in pressure that is needed to reverse the change in the value of the parameter is calculated. The pressure in the chamber is then changed to correct for the amount of time that the laser has been in operation.