Danny Ray Linthicum

US Patent:

58377450, Nov 17, 1998

Filed:

Apr 10, 1997

Appl. No.:

8/838569

Inventors:

Eugen Safta - Winston Salem NC
James V. Mirante - Archdale NC
Danny R. Linthicum - Lexington NC
Greg Muselman - Greensboro NC

Assignee:

Lilly Industries, Inc. - Indianapolis IN

International Classification:

C08J 307
C08J 328
C08L 8304
C08L 8307

US Classification:

522 8

Abstract:

A free-radical polish composition is described. The composition can be applied and cured as an ultra thin film on finished surfaces to provide enhanced chemical and mar resistance. The composition comprises an aqueous emulsion including an olefin-functional polymer having low glass transition temperature or an olefin-functional prepolymer, and a silicone or silicone copolymer preferably with photoinitiators for UV and EB cure. The polish/emulsion can be applied, for example, to wet the surface of nitrocellulose lacquer wood finishes. The polish wet surface is first wiped to remove excess polish and thereafter exposed to UV radiation to provide a thin, polymerized permanent protective film on the polished surface.

US Patent:

59944242, Nov 30, 1999

Filed:

Feb 12, 1998

Appl. No.:

9/022938

Inventors:

Eugen Safta - Winston-Salem NC
Frank Chen - Greensboro NC
Greg Muselman - Greensboro NC
James V. Mirante - Archdale NC
Danny R. Linthicum - Lexington NC

Assignee:

Lilly Industries, Inc. - Indianapolis IN

International Classification:

C08J 718
C08J 307
C08J 328
C08L 8304

US Classification:

522 8

Abstract:

A free-radical curable polish composition is described. The composition can be applied and cured as an ultra thin film on finished surfaces to provide enhanced chemical and mar resistance. The composition comprises an aqueous emulsion including an olefin-functional polymer or an olefin-functional prepolymer, and a silicone or silicone copolymer preferably with photoinitiators for UV and EB cure. The polish/emulsion can be applied, for example, to wet the surface of nitrocellulose lacquer wood finishes. The polish wet surface is first wiped to remove excess polish and thereafter exposed to UV radiation to provide a thin, polymerized protective film.