David B. Beach - Knoxville TN Jonathan S. Morrell - Knoxville TN Mariappan Paranthaman - Knoxville TN Thomas Chirayil - Knoxville TN Eliot D. Specht - Knoxville TN Amit Goyal - Knoxville TN
A laminate article comprises a substrate and a biaxially textured (RE RE ) O buffer layer over the substrate, wherein 0x1 and RE and RE are each selected from the group consisting of Nd, Sm, Eu, Ho, Er, Lu, Gd, Tb, Dy, Tm, and Yb. The (RE RE ) O buffer layer can be deposited using sol-gel or metal-organic decomposition. The laminate article can include a layer of YBCO over the (RE RE ) O buffer layer. A layer of CeO between the YBCO layer and the (RE RE ) O buffer can also be include. Further included can be a layer of YSZ between the CeO layer and the (RE RE ) O buffer layer. The substrate can be a biaxially textured metal, such as nickel. A method of forming the laminate article is also disclosed.
Laminate Articles On Biaxially Textured Metal Substrates
David B. Beach - Knoxville TN Jonathan S. Morrell - Knoxville TN Mariappan Paranthaman - Knoxville TN Thomas Chirayil - Knoxville TN Eliot D. Specht - Knoxville TN Amit Goyal - Knoxville TN
A laminate article comprises a substrate and a biaxially textured (RE RE ) O buffer layer over the substrate, wherein 0x1 and RE and RE are each selected from the group consisting of Nd, Sm, Eu, Ho, Er, Lu, Gd, Tb, Dy, Tm, and Yb. The (RE RE ) O buffer layer can be deposited using sol-gel or metal-organic decomposition. The laminate article can include a layer of YBCO over the (RE RE ) O buffer layer. A layer of CeO between the YBCO layer and the (RE RE ) O buffer can also be include. Further included can be a layer of YSZ between the CeO layer and the (R RE ) O buffer layer. The substrate can be a biaxially textured metal, such as nickel. A method of forming the laminate article is also disclosed.
Storage Capacitors Using High Dielectric Constant Materials
David B. Beach - Knoxville TN Alfred Grill - White Plains NY Christopher J. Smart - Wappingers Falls NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01G 438
US Classification:
361328
Abstract:
A storage capacitor having high dielectric constant materials and a method for forming same are described. The method solves the problems associated with fabrication of planar capacitors for DRAM chips constructed from inorganic oxides with perovskite structure. These materials are not readily etched by conventional ion etching techniques. These materials also react with silicon and silicon dioxide and the disclosed process avoids these interactions.
Method Of Fabricating Storage Capacitors Using High Dielectric Constant Materials
David B. Beach - Knoxville TN Alfred Grill - White Plains NY Christopher J. Smart - Wappingers Falls NY
Assignee:
International Business Machines Corporation - Armonk NY
International Classification:
H01L 2170
US Classification:
437 60
Abstract:
A storage capacitor having high dielectric constant materials and a method for forming same are described. The method solves the problems associated with fabrication of planar capacitors for DRAM chips constructed from inorganic oxides with perovskite structure. These materials are not readily etched by conventional ion etching techniques. These materials also react with silicon and silicon dioxide and the disclosed process avoids these interactions.
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