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David B Blumel

age ~68

from Philadelphia, PA

Also known as:
  • David G Blumel
  • David B Blummel
  • Lumel E David

David Blumel Phones & Addresses

  • Philadelphia, PA
  • Yonkers, NY
  • 215 105Th St, New York, NY 10025 • (212)6784801
  • 130 Mulberry St APT 6, New York, NY 10013
  • Brooklyn, NY

Work

  • Position:
    Food Preparation and Serving Related Occupations

Education

  • Degree:
    Bachelor's degree or higher

Us Patents

  • Flip Chip With Integrated Flux And Underfill

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  • US Patent:
    20010003058, Jun 7, 2001
  • Filed:
    Dec 6, 2000
  • Appl. No.:
    09/730995
  • Inventors:
    Kenneth Gilleo - Cranston RI, US
    David Blumel - New York NY, US
  • International Classification:
    H01L021/44
    B32B005/00
    H01L021/48
    H01L021/50
    B32B005/16
    H01L023/48
    H01L023/52
    H01L029/40
    H01L023/29
  • US Classification:
    438/612000, 428/626000, 428/209000, 428/929000, 428/323000, 428/457000, 438/613000, 438/108000, 438/127000, 257/737000, 257/773000, 257/778000, 257/789000
  • Abstract:
    A flip chip having solder bumps and an integrated flux and underfill, as well as methods for making such a device, is described. The resulting device is well suited for a simple one-step application to a printed circuit board, thereby simplifying flip chip manufacturing processes which heretofore have required separate fluxing and underfilling steps.
  • Flip Chip With Integrated Flux And Underfill

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  • US Patent:
    61947881, Feb 27, 2001
  • Filed:
    Mar 10, 1999
  • Appl. No.:
    9/266232
  • Inventors:
    Kenneth Burton Gilleo - Cranston RI
    David Blumel - New York NY
  • Assignee:
    Alpha Metals, Inc. - Jersey City NJ
  • International Classification:
    H01L 2329
    H01L 23495
  • US Classification:
    257789
  • Abstract:
    A flip chip having solder bumps and an integrated flux and underfill, as well as methods for making such a device, is described. The resulting device is well suited for a simple one-step application to a printed circuit board, thereby simplifying flip chip manufacturing processes which heretofore have required separate fluxing and underfilling steps.
  • Flip Chip With Integrated Mask And Underfill

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  • US Patent:
    62286781, May 8, 2001
  • Filed:
    Mar 10, 1999
  • Appl. No.:
    9/266166
  • Inventors:
    Kenneth Burton Gilleo - Cranston RI
    David Blumel - New York NY
  • Assignee:
    Fry's Metals, Inc. - Jersey City NJ
  • International Classification:
    H01L 2144
    H01L 2148
    H01L 2150
  • US Classification:
    438108
  • Abstract:
    A flip chip having solder bumps, an integrated underfill, and a separate flux coating, as well as methods for making such a device, is described. The device is characterized in that the underfill material is provided on the chip surface prior to the application of solder bumps, and then treated to form apertures therein which act as a mask for solder bump application. The resulting device is well suited for a simple one-step application to a printed circuit board, thereby simplifying flip chip manufacturing processes which heretofore have required a separate underfilling step.
  • Wafer Coating Method For Flip Chips

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  • US Patent:
    63230623, Nov 27, 2001
  • Filed:
    Sep 14, 1999
  • Appl. No.:
    9/395553
  • Inventors:
    Kenneth Burton Gilleo - Cranston RI
    David Blumel - New York NY
    James McLenaghan - North Kingstown RI
  • Assignee:
    Alpha Metals, Inc. - Jersey City NJ
  • International Classification:
    H01L 2144
    H01L 2148
    H01L 2150
  • US Classification:
    438114
  • Abstract:
    A method for applying an underfill and edge coating to a flip chip is described. The method includes the steps of adhering a bumped wafer to an expandable carrier substrate, sawing the wafer to form individual chips, stretching the carrier substrate in a bidirectional manner to form channels between each of the individual chips, applying an underfill material to the bumped surfaces of the chips and around the edges of the chips, cutting the underfill material in the channels between the chips and removing the individual, underfill coated chips from the carrier.
  • Rosin-Free, Low Voc, No-Clean Soldering Flux And Method Using The Same

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  • US Patent:
    55713408, Nov 5, 1996
  • Filed:
    Sep 9, 1994
  • Appl. No.:
    8/303668
  • Inventors:
    Alvin F. Schneider - Warren NJ
    David B. Blumel - New York NY
    Jack Brous - Livingston NJ
  • Assignee:
    Fry's Metals, Inc. - Providence RI
  • International Classification:
    B23K 3534
  • US Classification:
    148 23
  • Abstract:
    A rosin-free, low VOC, no-clean soldering flux consists essentially of one or more halide-free carboxylic acid activators in an aggregate amount not exceeding about 8% by weight of the flux; one or more alkyl amines capable of forming amine salt of the one or more activators and in an aggregate amount not exceeding about 10% by weight of the flux; and water, with or without a surfactant. The flux is particularly useful in a method of producing soldered printed wiring assemblies with minimal residual ionic contamination, so that post-soldering cleaning of the assemblies is unnecessary.
  • No-Clean Soldering Flux And Method Using The Same

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  • US Patent:
    52977218, Mar 29, 1994
  • Filed:
    Nov 19, 1992
  • Appl. No.:
    7/976931
  • Inventors:
    Alvin F. Schneider - Edison NJ
    David B. Blumel - New York NY
    John V. Tomczak - Dolton IL
  • Assignee:
    Fry's Metals, Inc. - Providence RI
  • International Classification:
    B23K 35363
  • US Classification:
    2281801
  • Abstract:
    A no-clean soldering flux consists essentially of one or more halide-free, water soluble activators in an aggregate amount not exceeding about 5% by weight of the flux, a water soluble fluorinated surfactant in an amount not exceeding about 1% by weight of the flux, and water. The flux is substantially VOC-free and is particularly useful in a method of producing soldered printed wiring assemblies with minimal residual ionic contamination, so that post-soldering cleaning of the assemblies is unnecessary. The absence of significant amounts of VOC's and the elimination of post-soldering cleaning result in substantial environmental and production-related benefits.
  • Flip Chip Having Integral Mask And Underfill Providing Two-Stage Bump Formation

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  • US Patent:
    62286811, May 8, 2001
  • Filed:
    Sep 14, 1999
  • Appl. No.:
    9/395558
  • Inventors:
    Kenneth Burton Gilleo - Cranston RI
    David Blumel - New York NY
  • Assignee:
    Fry's Metals, Inc. - Jersey City NJ
  • International Classification:
    H01L 2144
    H01L 2148
    H01L 2150
  • US Classification:
    438108
  • Abstract:
    The present invention relates to a process for forming a two-stage bump on a flip chip. The process employs an underfill material which can be formed to act as a mask for application of bumps formed from a first composition to the flip chip. A material having a different composition can then be applied to the bumps.

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