David Wallace Buck

US Patent:

6448742, Sep 10, 2002

Filed:

Feb 15, 2001

Appl. No.:

09/784298

Inventors:

Michael D. Waterman - Chandler AZ
David W. Buck - Mesquite TX
Terry D. Morris - Buckeye AZ
James G. Winkel - Rockwall TX
David A. Crosby - Rowlett TX

Assignee:

Litton Systems, Inc. - Los Angeles CA

International Classification:

H01M 1046

US Classification:

320114

Abstract:

A transportable power source (P) for an image viewing device (D) includes a battery pack housing assembly ( ) to internally hold a first battery pack ( ). An electrical interface circuit ( ) receives an input voltage level ( ) and provides a resulting output voltage level ( ) as an output therefrom to operate the viewer device (D). The interface circuit ( ) receives a selected first input voltage level ( ) from the first battery pack ( ). Alternatively, the interface circuit ( ) receives a selected second input voltage level ( ) from a power supply source (S) external to the battery pack housing ( ). The interface circuit ( ) further includes a switch ( ) for selecting between sources of input voltage levels from among at least the first input voltage level ( ) and the second input voltage level ( ). The switch ( ) also selectively controls the source for the resulting output voltage level ( ).

US Patent:

6806683, Oct 19, 2004

Filed:

Feb 2, 2003

Appl. No.:

10/248631

Inventors:

Michael R. Saldana - New Braunfels TX
David W. Buck - Mesquite TX
Kenneth W. Sauter - Garland TX

Assignee:

Litton Systems, Inc. - Los Angeles CA

International Classification:

H02J 700

US Classification:

320110, 320107

Abstract:

A battery adapter (A) replaces two batteries ( ) with a single battery ( ) housed within a compartment ( ) of a battery powered electrical device (D). An electrically conductive housing ( ) adapted to replicate a selected battery and fit within a space adapted to house two of the selected sized batteries. A step up circuit ( ) mounted within the battery housing ( ) receives an electrical signal from a single battery ( ) and transforms the voltage of the electrical signal to simulate an electrical signal from two electrically connected selected batteries ( ).

US Patent:

7264177, Sep 4, 2007

Filed:

Aug 3, 2004

Appl. No.:

10/910435

Inventors:

David Aaron Buck - Little Elm TX, US
Thomas Daniel Storey - McKinney TX, US
Richard David Buck - Frisco TX, US

Assignee:

Intelligent Lawn Systems, L.P. - Little Elm TX

International Classification:

B12B 12/08
B15B 15/10
B07B 7/26
A01G 25/00
A01G 27/00
G05D 7/00
G05D 11/00

US Classification:

239 63, 239 10, 239 67, 239 69, 239201, 239203, 239305, 239307, 239310, 239321, 239407, 239413, 239DIG 15, 137 783, 700284

Abstract:

An automated irrigation and chemical treatment system comprising a user input device adapted to communicate with a control unit; a mixing chamber adapted to communicate with the control unit and connected to a water supply and chemical canisters, wherein each canister has a sensor to monitor fluid level therein, and control valves for connecting the mixing chamber to a network of pipes. Sprinkler heads connected to the network of pipes each include, a control valve adapted to control fluid flow to a water delivery nozzle by an electro magnet controlled rubber coated ferric ball closure member. The sprinkler heads include water and chemical saturation sensors and the sprinkler heads also communicate with the control unit via wireless transceivers. Multiple zones covered by the system may be treated according to predetermined schedules.

US Patent:

61044873, Aug 15, 2000

Filed:

Dec 12, 1997

Appl. No.:

8/989607

Inventors:

David Wallace Buck - Mesquite TX
Gabriel G. Barna - Richardson TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

G01L 2130
G01J 3443
G01J 330

US Classification:

356316

Abstract:

A system and process for analyzing the plasma discharge for various frequency components that can be correlated to wafer, chamber or equipment conditions. This system and process monitors (step 210), by using optical or electrical signals from the plasma, the low frequency plasma variations (step 220) generated during the wafer manufacturing process. For example, in endpoint detection applications, the amplitude variations of the plasma glow at a selected audio frequency, chosen for sensitivity to the etched material, is used to generate the endpoint signal (step 230). This endpoint signal has a potential response time equal to one cycle of the selected frequency plus minimal filtering due to noise reduction. To extract the vital parameters from the plasma glow, DSPs for frequency analysis or simple frequency filtering methods can be used.

US Patent:

62395874, May 29, 2001

Filed:

Dec 31, 1997

Appl. No.:

9/001815

Inventors:

David W. Buck - Mesquite TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

G01R 2726

US Classification:

324 95

Abstract:

A probe (10) has a main body (12), an input side (14) and an output side (16). The main body (12) has a cavity (17) to receive an insulator (18). The insulator (18) has a current slit (22) and a voltage slit (24) aligned with a first aperture (30a) and a second aperture (30b). An inner conductor extends through the insulator (18) from the input side (14) to the output side (42) of the main body (12). A current sensor (40) inserts into the first aperture (30a) and the current slit (22). A voltage sensor (50) inserts into the second aperture (30b) and the voltage slit (24). A radio frequency signal on a transmission line having a same impedance as the probe (10) enters the inner conductor (20) at the input side (14), induces a current onto the current sensor (40) and a voltage onto the voltage sensor (50). The induced current and voltage can be measured to monitor the characteristics of the transmission line.

US Patent:

54239427, Jun 13, 1995

Filed:

Jun 20, 1994

Appl. No.:

8/262800

Inventors:

Roger A. Robbins - Allen TX
Donald E. Brown - Bedford TX
David W. Buck - Mesquite TX
Alan D. Rose - Wylie TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H05H 100

US Classification:

1566431

Abstract:

A method and apparatus is provided for reducing wall erosion in a plasma containment tube (20), such as, for example, a quartz plasma tube (20) used in a microwave-induced plasma reaction process for etching semiconductor wafers. A pure benign or non-corrosive gas (Ar) is introduced into the "upstream" section (22a) of the tube (22), where the microwave energy is imparted to create a plasma. The activated benign gas flows "downstream" through a flange (28), preferably made of quartz, which is seated on o-rings (50) inside a water-cooled metal flange (48). These sealing o-rings (50) are thus cooled and removed from the ultraviolet light created by the plasma. The corrosive etchant gas (SF. sub. 6) is introduced into the "downstream" section (22b) of the tube (22) beyond the flange (28), where it is activated by the benign gas (Ar). The benign gas (Ar) flows principally along the inner sidewalls of the tube (22), and the etchant gas (SF. sub.