David M Wheeler

US Patent:

6751575, Jun 15, 2004

Filed:

Feb 14, 2001

Appl. No.:

09/783707

Inventors:

Gary A. Lenz - Eden Prairie MN
David B. Wheeler - Austin TX

Assignee:

Infoglide Corporation - Austin TX

International Classification:

G06F 1900

US Classification:

702182, 700 51, 700 52, 702179

Abstract:

The disclosed invention includes a system and method for monitoring and control of processes and machines. A computer-implemented method for monitoring and controlling a process comprises storing process attribute information of objects in a plurality of databases, receiving at least one process measurement from a measurement device, similarity searching the at least one process measurement against the process attribute information stored in the databases, assigning a similarity score to the process measurement, comparing the similarity score to a match tolerance level, computing a process action for at least one process machine, via an algorithm having a process variable, replacing the process variable in the algorithm with the process measurement where the similarity score is equal to or greater than the match tolerance level, replacing the process variable in the algorithm with a set point where the similarity score is lower than the match tolerance level, and communicating the process action to a process machine.

US Patent:

54879671, Jan 30, 1996

Filed:

Feb 17, 1995

Appl. No.:

8/390733

Inventors:

Richard S. Hutton - Summit NJ
Gary N. Taylor - Bridgewater NJ
David R. Wheeler - Albuquerque NM

Assignee:

AT&T Corp. - Murray Hill NJ

International Classification:

G03F 738

US Classification:

430322

Abstract:

A surface-imaging technique for lithographic processes is disclosed. The lithographic processes are used to manufacture integrated circuit devices. An image is produced on a resist that is applied onto a substrate. The image is produced by exposing selected regions of the resist material to radiation. The selected exposed regions correspond to the image. The resist is then exposed to a silylating reagent that selectively reacts with either the exposed or the unexposed region of the resist. The silylating reagent is combined with a cross-linking reagent. The silylated resist is then subjected to reactive ion etching, which forms an in situ silicon oxide etch mask over the silylated regions of the resist. The mask so formed provides etching selectivity which provides precise image transfer from the resist into the substrate.

Address:

3625 Bryant Ave S UNIT 4, Minneapolis, MN 55409

VIN:

2HGFA55569H705985

Make:

HONDA

Model:

CIVIC

Year:

2009