An electrode and getter structure for a ring laser gyroscope that includes a frame having a cavity therein that contains a gain medium and an electrode bore extending from a surface of the frame to the cavity includes a metalization layer formed on the surface of the frame. The metalization layer includes an electrode that is adjacent the electrode bore. A getter well is sealed to the metalization layer around the electrode bore, and a getter is mounted in the getter well spaced apart from the frame. The getter well preferably is a hollow glass cylinder having a closed end and an open end mounted to the metalization layer. A spring preferably is retained in the getter well by elastic forces in the spring with the getter being attached to the spring and aligned with the electrode bore.
Method Of Shaping A Flux Mask And Process Of Sputtering With The Shaped Flux Mask
William Debley - Northridge CA Leo Lam - Calabasas CA Radhakrishna Mandyam - Agoura Hills CA Dhirubhai Patel - West Hills CA
Assignee:
Litton Systems Inc. - Woodland Hills CA
International Classification:
C23C 1434
US Classification:
20419213, 20419211
Abstract:
The present invention provides a method for shaping a mask to reduce coating non-uniformity in the radial direction. A test run of the ion beam sputtering system coats a stationary glass plate having the same area and shape as the platen. The resulting coating thickness is measured across the surface of the glass plate and plotted as a function of position. This is the plot of the flux distribution. The coating rate pattern is determined by coating thickness by coating time. The desired width of the mask, which takes the form of a segment of a radial band is adjusted to obtain the desired average coating rate for the entire segment, masked and unmasked. This is repeated for each radial band. All these radial widths put together design the functional form of the mask, the use of which provides a uniform coating of the platen in a radial direction.