Diana T Ma

US Patent:

6413389, Jul 2, 2002

Filed:

Dec 17, 1999

Appl. No.:

09/467295

Inventors:

Hong Shih - Walnut CA
Danny Lu - Milpitas CA
Nianci Han - San Jose CA
Li Xu - San Jose CA
Diana Ma - Saratoga CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C02F 1461

US Classification:

2042291, 2042301, 2042307, 204272

Abstract:

A method and assembly for recovering a metal from by-products produced from etching a metal (e. g. , platinum, iridium, aluminum, etc. ) in a plasma processing chamber. The method includes recovering from the plasma processing chamber a deposit of the by-products containing the metal. The deposit is dissolved in an acid, and the metal is recovered from the acid by inserting a working electrode, a reference electrode, and a counter electrode into the acid and applying a difference in potential between the working and reference electrodes to cause current to flow through the working and counter electrodes and the metal to be removed from the liquid and deposit on the working electrode. The metal is removed from the working electrode to recover the metal. The assembly for recovering the metal from the by-products includes a potentiostat for effecting a difference in potential between the working and reference electrodes and causing current to flow through the working and counter electrodes in response to the difference in potential between the working and reference electrodes.

US Patent:

6466881, Oct 15, 2002

Filed:

Apr 22, 1999

Appl. No.:

09/298073

Inventors:

Hong Shih - Walnut CA
Joe Sommers - San Jose CA
Diana Ma - Saratoga CA

Assignee:

Applied Materials Inc. - Santa Clara CA

International Classification:

C23C 1434

US Classification:

702 84, 702 24, 702 33, 702 81, 702127

Abstract:

A method for determining the quality of a protective coating or layer on a structure inside of a reactor chamber. The method includes generating a basis, such as a standard scatter band of impedance, as an acceptable standard for the quality of a protective layer on the inside of a reactor chamber. At least one substrate is processed within a reactor chamber containing a protective coating for protecting the inside of the reactor chamber during processing of the substrate. The method further includes determining the quality of the protective coating, such as by measuring protective characteristics of the protective coating. A method for on-line monitoring of a quality of a coating on the inside of a reactor chamber.

US Patent:

6592707, Jul 15, 2003

Filed:

Oct 22, 2001

Appl. No.:

10/033115

Inventors:

Hong Shih - Walnut CA
Nianci Han - San Jose CA
Jie Yuan - San Jose CA
Joe Sommers - San Jose CA
Diana Ma - Saratoga CA
Paul Vollmer - Lewisbury OH
Michael C. Willson - Troy OH

Assignee:

Applied Materials Inc. - Santa Clara CA

International Classification:

H05H 100

US Classification:

1563451, 15634548, 118715, 118723 I

Abstract:

A corrosion-resistant protective coating for an apparatus and method of processing a substrate in a chamber containing a plasma of a processing gas. The protective coating or sealant is used to line or coat inside surfaces of a reactor chamber that are exposed to corrosive processing gas that forms the plasma. The protective coating comprises at least one polymer resulting from a monomeric anaerobic chemical mixture having been cured in a vacuum in the absence of oxygen. The protective coating includes a major proportion of at least one methacrylate compound and a minor proportion of an activator compound which initiates the curing process of the monomeric anaerobic mixture in the absence of oxygen or air.