Diane C Delaney

US Patent:

7162811, Jan 16, 2007

Filed:

Jun 16, 2003

Appl. No.:

10/462504

Inventors:

Diane E. Delaney - New Windsor NY, US
Cornelia A. Arndt - Pine Bush NY, US

International Classification:

F26B 7/00
F26B 3/00

US Classification:

34423, 34426, 34428, 34496

Abstract:

A method for completely drying polished nails without any smudging or nicking. The method utilizes first warm air and then very cold air followed by a brief return to warm air. The warm air of the inital step uses air at a temperature of approximately eighty-five degrees Farenhit for approximately four minutes. The very cold air has a temperature of approximately thirty-five degrees and is blown for approximately two minutes. The last step utilizes the intial heating temperature of eighty-five degrees Farenheit but for only fifteen seconds.

US Patent:

20040250440, Dec 16, 2004

Filed:

Jan 22, 2004

Appl. No.:

10/763624

Inventors:

Diane Delaney - New Windsor NY, US
Cornelia Arndt - Pine Bush NY, US

International Classification:

F26B019/00
F26B025/06

US Classification:

034/090000

Abstract:

A method and apparatus for completely drying polished nails without any smudging or nicking The method utilizes first warm air and then very cold air preferably followed by a brief return to warm air. The apparatus for performing the method includes a temperature controller for setting the temperature and timers for controlling the duration of each heating and cooling period. By means of an air heater and a cooler connected to a temperature controller, heats and cools the air which is forced upon the nails by a motor and fan.