The present invention provides a method for producing atomic ridges on a substrate comprising: depositing a first metal on a substrate; heating the substrate to form initial nanowires of the first metal on the substrate; depositing a second metal on the initial nanowires of the first metal to form thickened nanowires that are more resistant to etching than the initial nanowires; and etching the substrate to form atomic ridges separated by grooves having a pitch of 0. 94 to 5. 35 nm. The present invention also provides a method for forming Au and other metal nanowires that may be used for electrical conductors and both positive and negative etch masks to form a plurality of ridges at a pitch of 0. 94 to 5. 35 nm containing at least two adjacent grooves with widths of 0. 63 to 5. 04 nm.
The present invention provides a multi-tip array device comprising: a substrate; a multi-tip array of atomic tips on the substrate, the multi-tip array having a pitch of 0. 94 to 5. 4 nm between adjacent tips in at least one direction; and means for moving the substrate. The present invention also provides an atomic claw comprising: a mounting block; a paddle having a multi-tip array thereon, the multi-tip array having a pitch of 0. 94 to 5. 4 nm between adjacent tips in at least one direction; and a cantilever connected to the paddle and the mounting block, wherein the cantilever allows the paddle to be moved in at least one arcuate direction.
Strongly Textured Atomic Ridge And Dot Mosfets, Sensors And Filters
Don Kendall - Albuquerque NM Mark J. Guttag - Alexandria VA
Assignee:
StarMega Corporation - Albuquerque NM
International Classification:
H01L 2714
US Classification:
257414, 428613
Abstract:
The present invention provides a MOSFET device comprising: a substrate including a plurality of atomic ridges, each of the atomic ridges including a semiconductor layer comprising Si and an dielectric layer comprising a Si compound; a plurality nanogrooves between the atomic ridges; at least one elongated molecule located in at least one of the nanogrooves; a porous gate layer located on top of the plurality of atomic ridges. The present invention also provides a membrane comprising: a substrate; and a plurality of nanowindows in the substrate and a method for forming nanowindows in a substrate.
The present invention provides a quantum structure product comprising a substrate having quantum ridges and quantum tips on at least one surface thereof. In some embodiments of the invention quantum ridges may support quantum wires and the quantum tips may support quantum dots. Grooves which separate the quantum ridges and quantum tips from each other may be shallow or deep, and may contain organic molecules, fullerene tubes, and fullerene balls.
Strongly Textured Atomic Ridge And Dot Mosfets, Sensors And Filters
The present invention provides a MOSFET device comprising: a substrate including a plurality of atomic ridges, each of the atomic ridges including a semiconductor layer comprising Si and an dielectric layer comprising a Si compound; a plurality nanogrooves between the atomic ridges; at least one elongated molecule located in at least one of the nanogrooves; a porous gate layer located on top of the plurality of atomic ridges. The present invention also provides a membrane comprising: a substrate; and a plurality of nanowindows in the substrate and a method for forming nanowindows in a substrate.
Don L. Kendall - Albuquerque NM, US Mark J. Guttag - Alexandria VA, US
Assignee:
Starmega Corporation - Albuquerque NM
International Classification:
H01L 21/311
US Classification:
438700, 977882, 977888, 438690
Abstract:
The present invention provides a MOSFET device comprising: a substrate including a plurality of atomic ridges, each of the atomic ridges including a semiconductor layer comprising Si and an dielectric layer comprising a Si compound; a plurality nanogrooves between the atomic ridges; at least one elongated molecule located in at least one of the nanogrooves; a porous gate layer located on top of the plurality of atomic ridges. The present invention also provides a membrane comprising: a substrate; and a plurality of nanowindows in the substrate and a method for forming nanowindows in a substrate.
The present invention provides a quantum structure product comprising a substrate having quantum ridges and quantum tips on at least one surface thereof. In some embodiments of the invention quantum ridges may support quantum wires and the quantum tips may support quantum dots. Grooves which separate the quantum ridges and quantum tips from each other may be shallow or deep, and may contain organic molecules, fullerene tubes, and fullerene balls.
Don Leslie Kendall - Richardson TX Millard Monroe Judy - Dallas TX
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
H01C 706 H01L 2702 H01L 2906
US Classification:
338 9
Abstract:
Disclosed is a method for providing electronic semiconductor devices and the devices produced thereby utilizing an orientation dependent etch to selectively provide grooves in a monocrystalline silicon substrate having a crystal orientation of (110). By selectively etching with an orientation dependent etch to provide deep grooves having substantially parallel sidewalls and thereafter refilling with an appropriate material of the appropriate conductivity, a plurality of semiconductor electronic devices are provided.