Donald Ebenezer Samuels

US Patent:

55231861, Jun 4, 1996

Filed:

Dec 16, 1994

Appl. No.:

8/357889

Inventors:

Burn J. Lin - Tampa FL
Donald J. Samuels - Yorktown NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G03F 900

US Classification:

430 5

Abstract:

A photolithographic technique and apparatus involving two exposures and the sectioning of a first original mask opening that has segments which conflict with a second original mask opening. A plurality of segmented openings are configured in a first mask including at least one phase shifted opening and at least one non-phase shifted opening. Imaging radiation is projected through the plurality of segmented openings onto at least two electromagnetic radiation application regions (EARs) on a surface to be imaged during one exposure, with one of the two EAR's being phase shifted and the other non-phase shifted. At least one segmented opening is formed in a second mask. Radiation is projected through the second mask segmented opening onto one or more EARs on the surface during another exposure. At least one of the second mask EARs interconnects at least one of the phase shifted EARs and one of the non-phase shifted EARs. The first mask is a split mask, the second mask is a cover mask and both masks may be on a single mask substrate.