Douglas R Richards

US Patent:

7775219, Aug 17, 2010

Filed:

Dec 29, 2006

Appl. No.:

11/617891

Inventors:

Victor B. Mimken - Boise ID, US
Scott Meyer - Boise ID, US
Douglas Richards - Meridian ID, US
Evanson G. Baiya - Nampa ID, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B08B 3/10

US Classification:

134 941, 134 952, 134902

Abstract:

A method and apparatus for efficiently exhausting harmful vapors and fumes from a substrate processing chamber is described. The processing chamber includes a lower volume configured as a liquid atmosphere, and an upper volume configured as a gaseous atmosphere to at least partially contain vapors or fumes above the liquid. The apparatus includes a lid member configured to seal the processing chamber and a lid assembly adapted to provide processing liquids while exhausting the vapors or fumes from the processing chamber. Switchable valves and/or a variable source of negative pressure may be coupled to the lid assembly to provide a controlled exhaust. A method of preventing or minimizing the escape of fumes or vapors is also described.

US Patent:

20080163900, Jul 10, 2008

Filed:

Mar 13, 2007

Appl. No.:

11/685426

Inventors:

DOUGLAS RICHARDS - Meridian ID, US
Evanson G. Baiya - Nampa ID, US
John J. Rosato - Boise ID, US
Madhava Rao Yalamanchili - Eagle ID, US

International Classification:

B08B 3/08

US Classification:

134 89, 134 88

Abstract:

A method and system for cleaning a batch of substrates is provided. The system includes a first cluster of vertical processing chambers, an IPA reservoir, and an IPA delivery system in fluid communication with the IPA reservoir and the first cluster of vertical processing chambers, wherein the IPA delivery system is adapted to transfer IPA vapor between the IPA reservoir and the first cluster of vertical processing chambers. In certain embodiments, the system further comprises a first main circulation tank, a second main circulation tank, a reservoir-cluster recirculation circuit in fluid communication with the first main circulation tank and the second main circulation tank and with each processing chamber in the first cluster of vertical processing chambers, and a dosing circuit comprising a plurality of additive sources in fluid communication with the first main circulation tank and the second main circulation tank.