Duc D Buckius

US Patent:

20110265549, Nov 3, 2011

Filed:

Oct 29, 2010

Appl. No.:

12/915345

Inventors:

JAMES P. CRUSE - Santa Cruz CA, US
JOHN W. LANE - San Jose CA, US
DUC BUCKIUS - San Jose CA, US
BERRIN DARAN - San Jose CA, US
CORIE LYNN COBB - Mountain View CA, US
MING XU - San Jose CA, US
ANDREW NGUYEN - San Jose CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

G01F 25/00
F15D 1/00

US Classification:

73 116, 137861

Abstract:

Methods and apparatus for calibrating a plurality of gas flows in a substrate processing system are provided herein. In some embodiments, a substrate processing system may include a cluster tool comprising a first process chamber and a second process chamber coupled to a central vacuum transfer chamber; a first flow controller to provide a process gas to the first process chamber; a second flow controller to provide the process gas to the second process chamber; a mass flow verifier to verify a flow rate from each of the first and second flow controllers; a first conduit to selectively couple the first flow controller to the mass flow verifier; and a second conduit to selectively couple the second flow controller to the mass flow verifier.

US Patent:

20080103623, May 1, 2008

Filed:

Jun 28, 2007

Appl. No.:

11/770546

Inventors:

Oscar Gomez - South San Francisco CA, US
Jeffrey Barrett Robinson - San Jose CA, US
Jason Kirk Foster - San Jose CA, US
Duc Dang Buckius - Union City CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

G06F 19/00

US Classification:

700121

Abstract:

One embodiment of an apparatus includes a flat, plate-shaped template adapted for facilities integration. The template defines a plurality of apertures arranged in a predetermined pattern of locations, each template aperture adapted to position a facility conduit passing through each template aperture in a predetermined location to facilitate subsequently coupling the positioned facility conduit to the wafer processing tool. Other embodiments are described and claimed.

US Patent:

20220262600, Aug 18, 2022

Filed:

Feb 12, 2021

Appl. No.:

17/175216

Inventors:

- Santa Clara CA, US
Ashley Mutsuo OKADA - San Jose CA, US
Michael D. WILLWERTH - Campbell CA, US
Duc Dang BUCKIUS - San Jose CA, US
Jeffrey LUDWIG - San Jose CA, US
Aditi MITHUN - San Jose CA, US
Benjamin SCHWARZ - San Jose CA, US

International Classification:

H01J 37/32
H01L 21/3065

Abstract:

A gas distribution apparatus is provided having a first reservoir with a first upstream end and a first downstream end and a second reservoir with a second upstream end and a second downstream end. A reservoir switch valve is in fluid communication with the first downstream end of the first reservoir and the second downstream end of the second reservoir. The reservoir switch valve operable to selectively couple the first reservoir to an outlet of the reservoir switch valve when in a first state, and couple the second reservoir to the outlet of the reservoir switch valve when in a second state. A plurality of proportional flow control valves are provided having inlets coupled in parallel to the outlet of the reservoir switch valve The plurality of proportional flow control valves have outlets configured to provide gas to a processing chamber.