Edward Brian Fletcher

US Patent:

7837921, Nov 23, 2010

Filed:

Oct 5, 2005

Appl. No.:

11/244428

Inventors:

Frank Y. Xu - Round Rock TX, US
Pankaj B. Lad - Austin TX, US
Ian M. McMackin - Austin TX, US
Van N. Truskett - Austin TX, US
Edward B. Fletcher - Austin TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B28B 7/36
B28B 11/10
G03C 1/00

US Classification:

264293, 264338, 977887, 4302701

Abstract:

The present invention provides a method that features improved wetting characteristics while allowing preferential adhesion and release characteristics with respect to a substrate and a mold having imprinting material disposed therebetween. The method includes coating a surface of the mold with a volume of surfactant containing solution. The surfactant in the solution includes a hydrophobic component consisting essentially of a plurality of fluorine-containing molecules. The distribution of the plurality of the fluorine atoms in the fluorine-containing molecules, as well as the fluorine-containing molecules throughout the volume provides a desired contact angle with respect to a polymerizable composition disposed on the substrate. The contact angle is in a range of 50 or less.

US Patent:

7845931, Dec 7, 2010

Filed:

Sep 20, 2007

Appl. No.:

11/858687

Inventors:

Frank Y. Xu - Round Rock TX, US
Edward Brian Fletcher - Austin TX, US
Pankaj B. Lad - DeSoto TX, US
Michael P. C. Watts - Austin TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B29C 59/00

US Classification:

425385, 264293

Abstract:

The present invention includes a method of solidifying a polymerizable liquid to form a film on a substrate that features minimizing inhibition of the polymerization process by oxygen contained in the atmosphere surrounding the polymerizable liquid. To that end, the polymerizable liquid includes, inter alia, an initiator that consumes oxygen that interacts with the polymerizable liquid and generates additional free radicals to facilitate the polymerizable process.

US Patent:

7939131, May 10, 2011

Filed:

Aug 16, 2004

Appl. No.:

10/919224

Inventors:

Frank Y. Xu - Round Rock TX, US
Christopher J. Mackay - Austin TX, US
Pankaj B. Lad - Austin TX, US
Ian M. McMackin - Austin TX, US
Van N. Truskett - Austin TX, US
Wesley D. Martin - Austin TX, US
Edward B. Fletcher - Austin TX, US
David C. Wang - Austin TX, US
Nicholas A. Stacey - Austin TX, US
Michael P. C. Watts - Austin TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B05D 3/12

US Classification:

427240, 260824, 4302701, 244 131, 427 57, 427346, 427421, 428 368

Abstract:

The present invention includes a method and a composition to form a layer on a substrate having uniform etch characteristics. To that end, the method includes controlling variations in the characteristics of a solid layer, such etch characteristics over the area of the solid layer as a function of the relative rates of evaporation of the liquid components that comprise the composition from which the solid layer is formed.

US Patent:

8142702, Mar 27, 2012

Filed:

Jun 16, 2008

Appl. No.:

12/139911

Inventors:

Weijun Liu - Austin TX, US
Frank Y. Xu - Round Rock TX, US
Edward Brian Fletcher - Austin TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B29C 59/00
H01L 21/027

US Classification:

264293, 4274211, 4274272, 427600

Abstract:

A solid layer is formed by applying a multiplicity of discrete portions of a fluid composition onto a surface of an imprint lithography substrate, and allowing the discrete portions of the composition to spontaneously spread on the surface of the substrate to form a substantially continuous layer. The composition includes a solvent and a solid or a solvent and a polymerizable material. The composition can be a solution or a dispersion. At least some of the solvent is evaporated from the composition, and a solid layer is formed (e. g. , polymerized or dried) on the substrate. The solid layer is substantially free of interstitial voids.

US Patent:

8268220, Sep 18, 2012

Filed:

Oct 15, 2010

Appl. No.:

12/905192

Inventors:

Frank Y. Xu - Round Rock TX, US
Pankaj B. Lad - DeSoto TX, US
Ian Matthew McMackin - Austin TX, US
Van Nguyen Truskett - Austin TX, US
Edward Brian Fletcher - Austin TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B29C 59/02
B29C 33/60

US Classification:

264293, 264338

Abstract:

Improved wetting characteristics together with improved release characteristics with respect to a substrate and an imprint lithography mold having imprinting material disposed therebetween.

US Patent:

8361546, Jan 29, 2013

Filed:

Oct 27, 2009

Appl. No.:

12/606588

Inventors:

Edward B. Fletcher - Austin TX, US
Zhengmao Ye - Austin TX, US
Dwayne L. LaBrake - Cedar Park TX, US
Frank Y. Xu - Round Rock TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B05D 5/10

US Classification:

4272071, 427133, 4272088, 427569, 428408, 428447, 428698

Abstract:

Systems and methods for adhering a substrate to a patterned layer are described. Included are in situ cleaning and conditioning of the substrate, and the application of an adhesion layer between the substrate and the patterned layer, as well as forming an intermediate layer between adhesion materials and the substrate.

US Patent:

8641941, Feb 4, 2014

Filed:

Apr 13, 2012

Appl. No.:

13/446364

Inventors:

Edward Brian Fletcher - Austin TX, US
Frank Y. Xu - Round Rock TX, US

Assignee:

Molecular Imprints, Inc. - Austin TX

International Classification:

B29C 59/02

US Classification:

264 39, 264219, 264338

Abstract:

An imprint lithography template having a photoactive coating adhered to a surface of the template. Irradiation of the photoactive coating promotes cleaning of the template by decomposition of organic material proximate the template (e. g. , organic material adsorbed on the template). An imprint lithography system may be configured such that template cleaning is achieved during formation of a patterned layer on an imprint lithography substrate. Cleaning of the template during an imprint lithography process reduces down-time that may be associated with template maintenance.

US Patent:

20050270312, Dec 8, 2005

Filed:

Jun 2, 2005

Appl. No.:

11/143092

Inventors:

Pankaj Lad - Austin TX, US
Ian McMackin - Austin TX, US
Van Truskett - Austin TX, US
Norman Schumaker - Austin TX, US
Sidlgata Sreenivasan - Austin TX, US
Duane Voth - Austin TX, US
Philip Schumaker - Austin TX, US
Edward Fletcher - Austin TX, US

International Classification:

B41J002/01

US Classification:

347001000

Abstract:

The present invention is directed to a method for dispensing a total volume of liquid on a substrate, the method including, inter alia, disposing a plurality of spaced-apart droplets on a region of the substrate, each having an unit volume associated therewith, with an aggregate volume of the droplets in the region being a function of a volume of a pattern to be formed thereat.