Dagan Brush - Flint MI, US Eric Lesher - Holly MI, US Robert Wyland - Davison MI, US
International Classification:
B01D053/34 B21D039/00
US Classification:
422/180000, 029/428000
Abstract:
The gas treatment device comprises a shell concentrically disposed around a catalyst substrate comprising a catalyst, and a mat support material disposed between the catalyst substrate and shell, and concentrically around the catalyst substrate. A retainer ring comprising a first wall and a second wall connected by a bridge is concentrically disposed around the catalyst substrate. The retainer ring is in operable communication with the shell to form an interference fit, and also contacts the mat support material. The retainer ring can further comprise at least two segments.
Gas Treatment Device And System, And Method For Making The Same
Eric Lesher - Holly MI, US Stephen Myers - Owosso MI, US Michael Foster - Columbiaville MI, US John Boehnke - Grand Blanc MI, US
International Classification:
B01D053/34 F01N003/28
US Classification:
422/179000, 422/171000, 422/177000, 029/890000
Abstract:
One embodiment of a gas treatment device comprises: a substrate; a housing disposed concentrically about the substrate, the housing comprising a first portion having a decreasing internal diameter from a first end to a main body portion, the main body portion extending from the first portion; and a mat support material disposed concentrically about the substrate to form a subassembly, wherein the subassembly is at least partially disposed in the main body portion. One embodiment of a method for producing the gas treatment device comprises: disposing a mat support material about a substrate to form a subassembly; passing at least a portion of the subassembly into a main body portion of a housing comprising a first portion having a decreasing internal diameter from a first end to the main body portion, the main body portion extending from the first portion.
Gas Treatment Device, And Methods Of Making And Using The Same
Jeffrey Hardesty - Byron MI, US Gordon Rutland - Flint MI, US Stephen Thomas - Laingsburg MI, US Amy Bowers - Mt. Morris MI, US Dagan Brush - Troy MI, US Eric Lesher - Holly MI, US Robert Wyland - Davison MI, US
International Classification:
B01D053/34
US Classification:
422179000, 422180000, 422177000, 029890000
Abstract:
A gas treatment device comprises a housing; a substrate disposed within the housing; a retention device disposed between the housing and the substrate, wherein the retention device comprises a plurality of individual spring elements, and a break, wherein the plurality of individual spring elements exert a compressive force against the housing and the substrate such that the substrate is retained within the housing; and a support material disposed between the housing and the substrate.