Fang Liu

US Patent:

20120109801, May 3, 2012

Filed:

Oct 27, 2010

Appl. No.:

12/912953

Inventors:

John CLARK, JR. - Pepperell MA, US
Shailesh KUMAR - Littleton MA, US
Fang LIU - Dracut MA, US
David BATTAGLIA - Sandy Hook CT, US

Assignee:

ORACLE INTERNATIONAL CORPORATION - Redwood Shores CA

International Classification:

G06Q 40/00

US Classification:

705 35

Abstract:

A computer-readable medium, computer-implemented method, and financial close management system are provided that manage a schedule. A schedule is a core object of the financial close management system, and is an expression of a template. Managing a schedule can include creating a new schedule, modifying an existing schedule, deleting an existing schedule, duplicating an existing schedule, validating an existing schedule, creating a template from an existing schedule, setting a status of an existing schedule, and importing and exporting an existing schedule. In addition, managing a schedule can include defining task type parameters that can be set during scheduling and setting task parameters of a schedule at a schedule level rather than a task level.

US Patent:

20130157005, Jun 20, 2013

Filed:

Dec 20, 2011

Appl. No.:

13/331582

Inventors:

Fang Liu - Woburn MA, US
Kuang Yang - Newton MA, US

Assignee:

ANALOG DEVICES, INC. - Norwood MA

International Classification:

B32B 3/30
B05D 3/10

US Classification:

428141, 428161, 427299, 216 39, 427154

Abstract:

An array of microbumps with a layer or coating of non-superhydrophobic material yields a superhydrophobic surface, and may also have a contact angle hysteresis of 15 degrees or less. A surface with such an array may therefore be rendered superhydrophobic even though the surface structure and materials are not, by themselves, superhydrophobic.

US Patent:

20130257456, Oct 3, 2013

Filed:

Mar 30, 2012

Appl. No.:

13/435236

Inventors:

Fang Liu - Woburn MA, US
Kuang L. Yang - Newton MA, US

Assignee:

ANALOG DEVICES, INC. - Norwood MA

International Classification:

G01R 27/26

US Classification:

324658

Abstract:

A method for measuring retained surface charges within a MEMS device includes performing an initial voltage sweep on the MEMS device, and recording the capacitance between a first and second electrode of the MEMS device. The method may then (1) apply a stress signal to the MEMS device that causes a first and/or second electrode within the MES device to retain a surface charge, and (2) perform at least one additional voltage sweep on the MEMS device. The method may record the capacitance during the additional voltage sweep(s), and calculate a C-V center voltage shift based upon the data obtained during the initial voltage sweep and additional voltage sweep. The voltage shift is representative of the retained surface charge.

US Patent:

20140001577, Jan 2, 2014

Filed:

Jun 28, 2012

Appl. No.:

13/535781

Inventors:

Fang Liu - Woburn MA, US
Kuang L. Yang - Newton MA, US

Assignee:

ANALOG DEVICES, INC. - Norwood MA

International Classification:

H01L 29/84
H01L 21/02

US Classification:

257415, 438 50, 257E21002, 257E29324

Abstract:

A method for producing a MEMS device having improved charge elimination characteristics includes providing a substrate having one or more layers, and applying a first charge elimination layer onto at least one portion of one given layer of the substrate. The method may then (1) apply a sacrificial layer onto the first charge elimination layer, (2) apply a second charge elimination layer onto at least a portion of the sacrificial layer, and (3) deposit a movable layer onto at least a portion of the second charge elimination layer. To form a structure within the movable layer the method may etch the movable layer. The method may then etch the sacrificial layer to release the structure.

US Patent:

20140072150, Mar 13, 2014

Filed:

Sep 11, 2012

Appl. No.:

13/609872

Inventors:

Fang Liu - Woburn MA, US
Kuang L. Yang - Newton MA, US

Assignee:

ANALOG DEVICES, INC. - Norwood MA

International Classification:

H04R 1/00
H04R 31/00

US Classification:

381174, 427 976, 29 2541

Abstract:

A microelectromechanical microphone and method of manufacturing the same are disclosed. The microphone has a moveable diaphragm and a fixed backplate that create a variable capacitance. A fixed anchor electrically coupled to the diaphragm has an electrode that measures the variable capacitance, but also measures an unwanted, additive, parasitic capacitance. Various embodiments include a reference electrode, manufactured in the same deposition layer as the diaphragm or anchor, that measures only the parasitic capacitance. A circuit is provided either on-chip or off-chip that subtracts the capacitance measured at the reference electrode from that measured at the anchor, thereby producing only the desired variable capacitance as output. Because the reference electrode is deposited at the same time as the diaphragm or anchor, only minimal changes are required to existing manufacturing techniques.