Fong Ming Chang

US Patent:

6618265, Sep 9, 2003

Filed:

Oct 1, 2001

Appl. No.:

09/969202

Inventors:

Fong M. Chang - Los Gatos CA
Yu Chang - San Jose CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H05K 702

US Classification:

361760, 361775, 361823, 361828, 307 12, 307 29

Abstract:

All-or-none operation of a series of modular load elements is ensured by routing high and low voltage lines from a power source through opposite nodes positioned at either end of the series of load elements. This arrangement prevents activation of only a portion of the load elements where electrical connection between them is not successfully established.

US Patent:

6709715, Mar 23, 2004

Filed:

Jun 17, 1999

Appl. No.:

09/336368

Inventors:

Chi-I Lang - Sunnyvale CA
Shin-Puu Jeng - Hsinchu, TW
Yeming Jim Ma - Santa Clara CA
Fong Chang - Los Gatos CA
Peter Wai-Man Lee - San Jose CA
David W. Cheung - Foster City CA

Assignee:

Applied Materials Inc. - Santa Clara CA

International Classification:

H05H 146

US Classification:

427489, 427578, 427579, 427563, 438789, 438788

Abstract:

A method and apparatus for depositing a low dielectric constant film by plasma assisted copolymerization of p-xylylene and a comonomer having carbon-carbon double bonds at a constant RF power level from about 0W to about 100W or a pulsed RF power level from about 20W to about 160W. The copolymer film has a dielectric constant from about 2. 2 to about 2. 5. Preferred comonomers include tetravinyltetramethylcyclotetrasiloxane, tetraallyloxysilane, and trivinylmethylsilane. The copolymer films include at least 1% by weight of the comonomer.

US Patent:

7950068, May 31, 2011

Filed:

Jan 4, 2008

Appl. No.:

11/969784

Inventors:

Fong Chang - Diamond Bar CA, US

International Classification:

A42B 1/00

US Classification:

21952

Abstract:

A headwear assembly, comprising a crown, a bill attached to said crown, and extending outwardly therefrom. The bill comprises an upper bill portion comprising a first periphery and a first closure means disposed along that first periphery, a lower bill portion comprising a second periphery and a second closure means disposed along that second periphery, wherein the first periphery can be releaseably attached to the second periphery by releaseably attaching the first closure means to the second closure means to define an enclosed space between the upper bill portion and the lower bill portion.

US Patent:

20030003696, Jan 2, 2003

Filed:

Jun 29, 2001

Appl. No.:

09/896124

Inventors:

Avgerinos Gelatos - Redwood City CA, US
Joel Huston - San Jose CA, US
Lawrence Lei - Milipitas CA, US
Vicky Nguyen - San Jose CA, US
Yin Lin - Palo Alto CA, US
Fong Chang - Los Gatos CA, US

International Classification:

H01L021/36
H01L021/20
C30B001/00

US Classification:

438/485000, 438/507000, 438/935000

Abstract:

Generally, a substrate processing apparatus is provided. In one aspect of the invention, a substrate processing apparatus is provided. In one embodiment, the substrate processing apparatus includes one or more chamber bodies coupled to a gas distribution system. The chamber bodies define at least a first processing region and a second processing region within the chamber bodies. The gas distribution system includes a first, a second and a third gas supply circuit. The first gas supply circuit is teed between the first and second processing regions and is adapted to supply a first processing gas thereto. The second gas supply circuit is coupled to the first processing region and adapted to supply a second process gas thereto. The third gas supply circuit is coupled to the second processing region and is adapted to supply a third process gas thereto. Alternatively, the processing regions may be disposed in a single chamber body.

US Patent:

20060169218, Aug 3, 2006

Filed:

Jun 24, 2005

Appl. No.:

11/165642

Inventors:

Fong Chang - Huntington Beach CA, US

International Classification:

A01K 1/03

US Classification:

119496000

Abstract:

A pet carrying apparatus in which a pet can get in or out of a bag structure by itself is provided. The bag structure has a definite inner space defined by a bag body, a positioning frame that is positioned on a periphery the bag body, and a front layer defining a pet opening therein, whereby a pet can get in or out of the inner space. The apparatus further has a vehicle body that defines a vehicle inner space. The vehicle body has a frame and a set of attached wheels. The apparatus also has a pair of connecting devices positioned opposite of each other. Each of the connecting devices being located at an inner side of the vehicle body such that when the bag structure is placed within the vehicle inner space, the pair of connecting devices is symmetrically placed on the positioning frame.

US Patent:

20070169719, Jul 26, 2007

Filed:

Mar 27, 2006

Appl. No.:

11/277601

Inventors:

Fong Chewn CHANG - Huntington Beach CA, US

International Classification:

A01K 1/03

US Classification:

119496000

Abstract:

A pet carrying bag having an expandable/collapsible sub chamber is disclosed. Two prop boards are inserted to the side vertical patches of the sub chamber, sustaining the bag in its expanded stated; the two prop boards can be stored in two bottom horizontal seam patches when the bag is in its collapsed stated. The flexibility of the present invention better accomodates pet owners' need to transport pets of varying sizes or when pet grows up in size.

US Patent:

61761982, Jan 23, 2001

Filed:

Nov 2, 1998

Appl. No.:

9/184934

Inventors:

Fong M. Chang - Los Gatos CA
Robert B. Majewski - Scotts Valley CA
John Parks - Richmond CA
David Wanamaker - San Jose CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23C 1600

US Classification:

118723ME

Abstract:

The invention provides a deposition system and methods of depositing materials onto substrates. In one aspect, a modular processing chamber is provided which includes a chamber body defining a processing region. The chamber body includes a removable gas feedthrough, an electrical feedthrough, a gas distribution assembly mounted on a chamber lid and a microwave applicator for generating reactive gases remote from the processing region.

US Patent:

59398310, Aug 17, 1999

Filed:

Nov 13, 1996

Appl. No.:

8/746658

Inventors:

Gary Fong - Cupertino CA
Fong Chang - Los Gatos CA
Long Nguyen - Fremont CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B08B 600

US Classification:

31511121

Abstract:

The present invention provides systems, methods and apparatus for high temperature (at least about 500-800. degree. C. ) processing of semiconductor wafers. The systems, methods and apparatus of the present invention allow multiple process steps to be performed in situ in the same chamber to reduce total processing time and to ensure high quality processing for high aspect ratio devices. Performing multiple process steps in the same chamber also increases the control of the process parameters and reduces device damage. In particular, the present invention can provide high temperature deposition, heating and efficient cleaning for forming dielectric films having thickness uniformity, good gap fill capability, high density, low moisture, and other desired characteristics.