Gregory S Verdict

US Patent:

6916397, Jul 12, 2005

Filed:

Jun 13, 2001

Appl. No.:

10/311131

Inventors:

Kenneth Pfeiffer - Austin TX, US
Gregory S. Verdict - Austin TX, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

C23F001/00
H01L021/306
C23C016/00

US Classification:

15634526, 15634531, 15634532, 118719

Abstract:

In a first aspect, a system includes (1) a chamber; (2) a variable speed vacuum pump coupled to the chamber; and (3) a pressure controller coupled to the chamber. The pressure controller compares a set point pressure with a pressure measurement for the chamber and adjusts a flow of gas through the pressure controller based on a difference between the pressure measurement and the set point pressure. The system includes a pressure measurement device coupled to the chamber and to the pressure controller, and a main controller coupled to the variable speed vacuum pump, the pressure controller and the pressure measurement device. The pressure measurement device measures a pressure within the chamber and provides a pressure measurement to the pressure controller and the main controller. The main controller (1) adjusts a speed of the variable speed vacuum pump; and (2) provides the set point pressure to the pressure controller.

US Patent:

20120304930, Dec 6, 2012

Filed:

May 31, 2012

Appl. No.:

13/485590

Inventors:

Gregory Scott Verdict - Austin TX, US
Kevin Griffin - Livermore CA, US
Allen Gregory Fox - Sunnyvale CA, US

International Classification:

C30B 25/14
B01D 29/52
B01D 46/42
B01D 53/74

US Classification:

118715, 422168, 55344, 55312

Abstract:

Apparatuses and systems are disclosed for exhausting by-products from a processing chamber. In an embodiment, a dual exhaust system for removing by-products from a processing chamber includes a first exhaust line and a second exhaust line with each line having a pressure control valve and a particle trap for removing by-products. A portion of the first exhaust line may be coupled in parallel with the second exhaust line. The second exhaust line can be isolated from the first exhaust line and cleaned while the first exhaust line is removing by-products from the processing chamber or vice versa. In one embodiment, an exhaust system for removing by-products from a processing chamber includes an exhaust line and valves for removing the by-products. The valves are designed to operate at a high temperature such that the heated by-products are in a vapor phase while being removed through the exhaust line.

US Patent:

6145673, Nov 14, 2000

Filed:

Mar 31, 1999

Appl. No.:

9/282586

Inventors:

Brian H. Burrows - San Jose CA
Joseph A. Kraus - Austin TX
Gregory S. Verdict - Austin TX

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

A47G 1908

US Classification:

211 4118

Abstract:

A wafer transfer cassette of the kind which includes a support frame, a first wafer supporting construction, and a second wafer supporting construction. The support frame includes first and second vertically extending support structures which are horizontally spaced from one another. The first wafer supporting construction includes a first bracket portion and a first fin portion extending from the first bracket portion. The first bracket portion is mounted to the first support structure in a position wherein the first fin portion extends from the first bracket portion towards the second support structure. The second wafer supporting construction includes a second bracket portion and a second fin portion extending from the second bracket portion. The second bracket portion is mounted to the second support structure in a position wherein the second fin portion extends from the second support structure towards the first support structure. The first and second fin portions have upper surfaces positioned relative to one another to jointly support a wafer in substantially a horizontal orientation.