Commercial Law Construction Law Insurance Coverage and Insurance Defense Litigation Personal Injury Defective and Dangerous Products Litigation
ISLN:
913226757
Admitted:
1997
University:
University of Florida, B.S., 1993
Law School:
University of Florida, Fredric G. Levin College of Law, J.D., 1996
License Records
Hae Y Kim
License #:
1206001164
Category:
Nail Technician License
Name / Title
Company / Classification
Phones & Addresses
Hae Kim Owner
Tobi Designs General Contractors-Single-Family Houses
3264 Ettie St, Oakland, CA 94608
Hae Kim Vice President Marketing
Teachscape, Inc. Schools and Educational Services
731 Market St Ste 400, San Francisco, CA 94103
Hae Young Kim President
''Tyches, Inc.'' Business Services at Non-Commercial Site · Nonclassifiable Establishments
1501 E Orangethorpe Ave, Fullerton, CA 92831 24994 Cliffrose St, Corona, CA 92883
Hae Kim President
Meher, Inc Hotels and Motels
674 N Broadway St, Hamilton, OH 45036 (513)9324111
Hae Kyung Kim President
SERVING FRIENDS USA Services-Misc
1777 Shoreline Dr Alameda, Alameda, CA 94501 2519 Parker St, Berkeley, CA 94704 430 S Hobart Blvd, Los Angeles, CA 90020 450 S St Andrews Pl, Los Angeles, CA 90020
Hae Goo Kim President
THE REVIVED PRESBYTERIAN CHURCH OF SOUTHERN CALIFORNIA
21732 S Verne Ave, Hawaiian Gardens, CA 90716
Hae Kim Owner
Tobi Designs New Single-Family Housing Construction (except Operative Bui
3264 Ettie St, Emeryville, CA 94608 (510)5942003, (510)2519519
- San Jose CA, US Niloy Mukherjee - San Ramon CA, US Yoshikazu Okuyama - Santa Cruz CA, US Bunsen B. Nie - Fremont CA, US Hae Young Kim - San Jose CA, US Somilkumar J. Rathi - San Jose CA, US
International Classification:
H01L 21/02 C23C 16/34 H01L 21/28 C23C 16/455
Abstract:
The disclosed technology generally relates to forming a thin film comprising titanium nitride (TiN), and more particularly to forming by a cyclical vapor deposition process the thin film comprising (TiN). In one aspect, a method of forming a thin film comprising TiN comprises exposing a semiconductor substrate to one or more first cyclical vapor deposition cycles each comprising an exposure to a first Ti precursor and an exposure to a first N precursor to form a first portion of the thin film and exposing the semiconductor substrate to one or more second cyclical vapor deposition cycles each comprising an exposure to a second Ti precursor and an exposure to a second N precursor to form a second portion of the thin film, wherein exposures to one or both of the first Ti precursor and the first N precursor during the one or more first cyclical vapor deposition cycles are at different pressures relative to corresponding exposures to one or both of the second Ti precursor and the second N precursor during the one or more second cyclical vapor deposition cycles. Aspects are also directed to semiconductor structures incorporating the thin film and method of forming the same.
Smooth Titanium Nitride Layers And Methods Of Forming The Same
- San Jose CA, US Niloy Mukherjee - San Ramon CA, US Hee Seok Kim - Seongnam, KR Kyu Jin Choi - Seongnam, KR Moonsig Joo - Suwon, KR Hae Young Kim - San Jose CA, US Yoshikazu Okuyama - Santa Cruz CA, US Bunsen B. Nie - Fremont CA, US Somilkumar J. Rathi - San Jose CA, US
International Classification:
H01L 21/02 C23C 16/455 H01L 21/28 C23C 16/34
Abstract:
The disclosed technology generally relates to forming a titanium nitride layer, and more particularly to forming by atomic layer deposition a titanium nitride layer on a seed layer. In one aspect, a semiconductor structure comprises a semiconductor substrate comprising a non-metallic surface. The semiconductor structure additionally comprises a seed layer comprising silicon (Si) and nitrogen (N) conformally coating the non-metallic surface and a TiN layer conformally coating the seed layer. Aspects are also directed to methods of forming the semiconductor structures.
Ms. Kim works in Fairfax, VA and 1 other location and specializes in Gastroenterology. Ms. Kim is affiliated with Inova Fair Oaks Hospital and Inova Fairfax Medical Campus.