Han Chia Chen

US Patent:

7707050, Apr 27, 2010

Filed:

Mar 11, 2004

Appl. No.:

10/797143

Inventors:

Han Chen - San Jose CA, US
Weimin Dong - Palo Alto CA, US
Andrew Coburn - Oakland CA, US

Assignee:

Risk Management Solutions, Inc. - Newark CA

International Classification:

G06Q 40/00

US Classification:

705 4, 705 2, 705 3, 705 39, 707102, 7071041

Abstract:

A system and method are provided for identifying exposure concentrations. The process of determining exposure concentrations may include organizing exposure data, defining parameters, determining elevated exposure concentrations, and providing output results. The exposure data may relate to at least geographical locations, policies, accounts, portfolios, treaties, and other exposure data. The parameters may be defined to include at least an area of analysis, a region of interest, a threshold amount, results parameters, and other parameters. The exposure concentration may include at least defining and locating exposure locations using various techniques. The results may be presented using textual, graphical, or other display schemes. The output may be configured to convey information such as positional accuracy of an identified area, exposure accumulation in a defined area, and other information.

US Patent:

8380545, Feb 19, 2013

Filed:

Apr 20, 2010

Appl. No.:

12/764045

Inventors:

Han Chen - San Jose CA, US
Weimin Dong - Palo Alto CA, US
Andrew Coburn - Oakland CA, US

Assignee:

Risk Management Solutions, Inc. - Newark CA

International Classification:

G06Q 40/00

US Classification:

705 4, 705 39, 707102, 7071041

Abstract:

A system and method are provided for identifying exposure concentrations. The process of determining exposure concentrations may include organizing exposure data, defining parameters, determining elevated exposure concentrations, and providing output results. The exposure data may relate to at least geographical locations, policies, accounts, portfolios, treaties, and other exposure data. The parameters may be defined to include at least an area of analysis, a region of interest, a threshold amount, results parameters, and other parameters. The exposure concentration may include at least defining and locating exposure locations using various techniques. The results may be presented using textual, graphical, or other display schemes. The output may be configured to convey information such as positional accuracy of an identified area, exposure accumulation in a defined area, and other information.

US Patent:

20210326500, Oct 21, 2021

Filed:

Jun 28, 2021

Appl. No.:

17/361253

Inventors:

- San Mateo CA, US
Han Chen - Cupertino CA, US

International Classification:

G06F 30/20
G06F 30/30

Abstract:

Systems and methods are disclosed for to generation of dynamic design flows for integrated circuits. For example, a method may include accessing a design flow configuration data structure, wherein the design flow configuration data structure is encoded in a tool control language; based on the design flow configuration data structure, selecting multiple flowmodules from a set of flowmodules, wherein each flowmodule provides an application programming interface, in the tool control language, to a respective electronic design automation tool; based on the design flow configuration data structure, generating a design flow as a directed acyclic graph including the selected flowmodules as vertices; and generating an output integrated circuit design data structure, based on one or more input integrated circuit design data structures, using the design flow to control the respective electronic design automation tools of the selected flowmodules.

US Patent:

20200349236, Nov 5, 2020

Filed:

Jul 31, 2019

Appl. No.:

16/527713

Inventors:

- San Mateo CA, US
Han Chen - Cupertino CA, US

International Classification:

G06F 17/50

Abstract:

Systems and methods are disclosed for to generation of dynamic design flows for integrated circuits. For example, a method may include accessing a design flow configuration data structure, wherein the design flow configuration data structure is encoded in a tool control language; based on the design flow configuration data structure, selecting multiple flowmodules from a set of flowmodules, wherein each flowmodule provides an application programming interface, in the tool control language, to a respective electronic design automation tool; based on the design flow configuration data structure, generating a design flow as a directed acyclic graph including the selected flowmodules as vertices; and generating an output integrated circuit design data structure, based on one or more input integrated circuit design data structures, using the design flow to control the respective electronic design automation tools of the selected flowmodules.