Henry H Pang

US Patent:

6988060, Jan 17, 2006

Filed:

Aug 1, 2000

Appl. No.:

09/629953

Inventors:

Paul Derek Coon - Redwood City CA, US
Henry Kwok Pang Chau - San Francisco CA, US
Arun Ananth Aiyer - Fremont CA, US

Assignee:

Nikon Corporation - Tokyo

International Classification:

G05F 17/50

US Classification:

703 13, 355 53, 355 67, 356400, 356401

Abstract:

An alignment simulation method simulates the signal waveform for an alignment mark using various alignment methods as well as the signal strength for an alignment mark, which is useful in optimizing the thickness of one or more layers as well as the geometry of the mark. The simulation of signal strength is also useful in optimizing the thickness of a layer for artifact wafers. The alignment simulation method includes accurately modeling the alignment mark, including one or more layers of various thicknesses and materials. The accurate modeling of the alignment mark includes such things as smoothing regions of the alignment mark and generating lateral shifts of the layers. The model of the alignment mark is a series of small pixels, each including the thickness of the layers and the layers indices of refraction. Using scalar diffraction, a complex reflectivity is generated for each pixel and a fast fourier transform is performed on the series of pixels. The results of the fast fourier transform are used to simulate the diffraction intensities for the alignment mark alignment systems, such as LIA or LSA as well as the signal waveforms.

US Patent:

20130182235, Jul 18, 2013

Filed:

Jan 10, 2013

Appl. No.:

13/738666

Inventors:

Nikon Coporation - Tokyo, JP
Akira Okutomi - Saitama, JP
Bausan Yuan - San Jose CA, US
Henry Kwok Pang Chau - Cupertino CA, US

Assignee:

NIKON CORPORATION - Tokyo

International Classification:

G03F 7/20

US Classification:

355 72, 355 77

Abstract:

A stage assembly () for positioning a device () along a first axis includes (i) a stage () that retains the device (); (ii) a mover assembly () that moves the stage () along the first axis; (iii) an interferometer (), (iv) an encoder (), and (v) a control system (). The interferometer () monitors the movement of the stage () along the first axis, the interferometer () generating an interferometer signal that relates to the movement of the stage () along the first axis. The encoder () monitors the movement of the stage () along the first axis, the encoder () generating an encoder signal that relates to the movement of the stage () along the first axis. The control system () utilizes both the encoder signal and the interferometer signal to control the mover assembly ().

US Patent:

20130188663, Jul 25, 2013

Filed:

Sep 25, 2012

Appl. No.:

13/626747

Inventors:

Henry Yang Pang - San Jose CA, US

International Classification:

H01S 3/091
H01S 3/094

US Classification:

372 70

Abstract:

A refractive optics-based dispersion control structure for a low-noise solid state laser standing-wave resonator has at least one dispersive element, a gain medium, and a frequency doubling element disposed in the resonant beam path. The dispersive element provides geometric-based laser bandwidth control that minimizes the laser output power noise. The dispersive element in certain embodiments may be a prism. The dispersive element in certain other embodiments may be integrally formed with the gain medium. Numerous different architectures using these elements are disclosed.

US Patent:

63203456, Nov 20, 2001

Filed:

Mar 5, 1998

Appl. No.:

9/036401

Inventors:

Bausan Yuan - San Jose CA
Kazuaki Saiki - Tokyo, JP
Henry Kwok Pang Chau - San Francisco CA

Assignee:

Nikon Corporation - Tokyo

International Classification:

H02P 704

US Classification:

318569

Abstract:

A command trajectory drives a stage to produce a smooth motion while minimizing any vibrations or oscillations of the structure. The command trajectory provides an acceleration and a deceleration that have derivatives, known as the jerk, equal to zero at the beginning and end of the acceleration and deceleration periods. Because the jerk is equal to zero at the beginning and end of acceleration and deceleration, the influence of the reactive forces on the positioning system's structure is reduced, thereby minimizing oscillation of the structure. Moreover, the jerk is continuous throughout the acceleration and deceleration periods, resulting in a smooth continuous motion of the stage. The jerk on the stage during acceleration and deceleration has an adjustable duration to reduce the structural disturbances and decrease settling time.

US Patent:

20200292304, Sep 17, 2020

Filed:

May 29, 2020

Appl. No.:

16/888235

Inventors:

- Tokyo, JP
Henry Pang - Foster City CA, US
Fardad A. Hashemi - Moraga CA, US

International Classification:

G01B 11/24
G03F 7/20

Abstract:

Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.

US Patent:

20170102760, Apr 13, 2017

Filed:

Oct 8, 2015

Appl. No.:

14/879040

Inventors:

- Santa Clara CA, US
Jonah ALBEN - San Jose CA, US
Andrew R. BELL - San Francisco CA, US
Ming CHEN - Palo Alto CA, US
Gabriele Gorla - Santa Clara CA, US
Qi LIN - San Jose CA, US
Henry PANG - San Jose CA, US

International Classification:

G06F 1/32

Abstract:

A power subsystem is configured to manage the maximum power usage of a computer subsystem. A power detector determines when power usage approaches the maximum capability of the power supply. The power detector generates a signal that corresponds to power usage. A controller then applies the signal to the system voltage regulator as a secondary regulation function such that the output voltage is reduced in a manner that supports maximum operating voltage while limiting power usage to within the capability of the power supply. The controller may configure the signal to implement the secondary regulation function as a modification of the feedback voltage, the reference voltage, or the current feedback of the regulator. As a result the subsystem causes the computer subsystem to operate at an optimum point on the voltage-current curve of the power supply.

US Patent:

20160305772, Oct 20, 2016

Filed:

Apr 14, 2016

Appl. No.:

15/099346

Inventors:

- Tokyo, JP
Henry Pang - Foster City CA, US
Fardad A. Hashemi - Moraga CA, US

International Classification:

G01B 11/24
G03F 7/20

Abstract:

Method and system for defining basis functions for fitting distortions of profiles of objects in a batch, that has undergone a fabrication process, in a manner adaptable to the fabrication process to reduce the errors between profiles approximated with the use of such basis functions and actual object profiles. Process-specific individual basis functions are defined based on spatially-dense measurement of objects from training sub-set of the batch and applying learning algorithm to results of such measurement. Advantages of process-adaptable basis functions over generic basis functions for fitting distortion shapes of objects include higher accuracy of fitting either at larger or a fewer locations across the object.