Howard C Brayman

US Patent:

6586756, Jul 1, 2003

Filed:

Jun 30, 2000

Appl. No.:

09/609660

Inventors:

David F. Kopperl - Rochester NY
Howard C. Brayman - Pittsford NY

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

G21G 400

US Classification:

2504931, 738656, 313572

Abstract:

An apparatus for subjecting light sensitive materials to visible radiation is disclosed which minimizes the amount of heat generated. The apparatus includes a source of visible radiation including at least one microwave energy responsive sulfur bulb and applies microwave energy to the sulfur bulb to cause the sulfur bulb to emit visible light. The apparatus further includes a holder defining a surface for receiving light sensitive materials located relative to the microwave energy responsive sulfur bulb. A light diffusing assembly is disposed relative to the sulfur bulb and responsive to the visible light emitted by the sulfur bulb to illuminate light sensitive materials received by the holder with diffused uniform visible light.

US Patent:

59498030, Sep 7, 1999

Filed:

Apr 22, 1998

Appl. No.:

9/064379

Inventors:

Howard C. Brayman - Pittsford NY
Mark S. Prichard - Rochester NY
John P. Spoonhower - Webster NY
Nicholas Touchard - Chalon sur Saone, FR
Thierry Vachette - Esbarres, FR

Assignee:

Eastman Kodak Company - Rochester NY

International Classification:

H01S 310

US Classification:

372 24

Abstract:

A method for exposing light sensitive material to provide exposure patches representing the material sensitivity and which minimizes the effects of intermittency of the light sensitive material, including providing a source of laser light by producing a laser light beam by a continuous wave pump laser which produces a first beam of light and a continuous wave dye laser responsive to the beam of light to produce a second beam of light having gaussian intensity distributions in two orthogonal directions; shaping the second light beam so as to produce a substantially square wave intensity distribution in one direction, while the other direction has a gaussian distribution; and scanning the shaped second light beam through a target of different uniform densities and onto light sensitive material so as to produce a series of exposure patches in one scan of different densities but with the density in each exposure patch being uniform, whereby the effect of intermittency in the light sensitive material is minimized.