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Howard S Kurasaki

age ~74

from San Jose, CA

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Also known as:
  • Kurasaki Howard
  • Howard I
Phone and address:
5001 Vanderbilt Dr, San Jose, CA 95130
(408)3790483
Related to:
Connected to:

Howard Kurasaki Phones & Addresses

  • 5001 Vanderbilt Dr, San Jose, CA 95130 • (408)3790483
  • 385 Cuesta Dr, Los Altos, CA 94024
  • 5001 Vanderbilt Dr, San Jose, CA 95130 • (619)7088890

Work

  • Company:
    Fujifilm dimatix, inc.
    Jan 1, 2015 to Dec 11, 2016
  • Position:
    Principal engineer

Education

  • School / High School:
    Los Altos High School

Skills

Semiconductor Industry • Semiconductors • Manufacturing • Product Development • Electronics • Failure Analysis • Integrated Circuits • Cross Functional Team Leadership • Engineering Management • Statistical Process Control

Languages

English

Interests

Cooking • Investing • Electronics • Home Improvement • Reading • Gourmet Cooking • Automobiles • Home Decoration

Emails

h***[email protected]

Industries

Semiconductors

Resumes

Howard Kurasaki Photo 1

Senior Engineer

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Location:
5001 Vanderbilt Dr, San Jose, CA 95130
Industry:
Semiconductors
Work:
Fujifilm Dimatix, Inc. Jan 1, 2015 - Dec 11, 2016
Principal Engineer
Micrel Jan 24, 2005 - Jan 26, 2015
Senior Process Development Engineer
Micrel Jan 24, 2005 - Jan 26, 2015
Senior Engineer
Education:
Los Altos High School
San Jose State University
Masters, Chemistry
Skills:
Semiconductor Industry
Semiconductors
Manufacturing
Product Development
Electronics
Failure Analysis
Integrated Circuits
Cross Functional Team Leadership
Engineering Management
Statistical Process Control
Interests:
Cooking
Investing
Electronics
Home Improvement
Reading
Gourmet Cooking
Automobiles
Home Decoration
Languages:
English

Us Patents

  • Method And System For Controlled Isotropic Etching On A Plurality Of Etch Systems

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  • US Patent:
    8580585, Nov 12, 2013
  • Filed:
    Dec 18, 2009
  • Appl. No.:
    12/642507
  • Inventors:
    Howard Kurasaki - San Jose CA, US
  • Assignee:
    Micrel, Inc. - San Jose CA
  • International Classification:
    H01L 21/67
  • US Classification:
    438 8, 438689, 15634523, 15634552, 257E21219
  • Abstract:
    A method for forming identical isotropic etch patterns in an etch system is disclosed. The method comprises providing a wafer paddle, a wafer, a plurality of identical etch systems, utilizing identical etch recipes within each of the plurality of etch systems, providing a fixed temperature stability time FTST for each system so that the heat transfer from the paddle to the wafer is constant, wherein the FTST is the same on each of the plurality of etch systems; and utilizing the plurality of identical etch systems to produce identical etches on each of the wafers based upon the FTST, wherein a five-second preheat step in the etch process is not utilized.

  • Dry Etch Process For Forming Champagne Profiles, And Dry Etch Apparatus

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  • US Patent:
    50134000, May 7, 1991
  • Filed:
    Jan 30, 1990
  • Appl. No.:
    7/472327
  • Inventors:
    Howard S. Kurasaki - San Jose CA
    Barbara F. Westlund - Saratoga CA
    James E. Nulty - San Jose CA
    E. John Vowles - Deering NH
  • Assignee:
    General Signal Corporation - Stamford CT
  • International Classification:
    H01L 21312
    B44C 122
    C03C 1500
    C03C 2506
  • US Classification:
    156643
  • Abstract:
    A two-step process for forming champagne profiles on semiconductor wafers that provide, when metallized, good reliability, microcracking-free contacts and vias is disclosed. Dry etch apparatus having electrodes in a triode configuration, two plasma forming regions, and a pressure control system operative to provide a wide setpoint pressure range is also disclosed.
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