Hsing H Chen

age ~87

from Broomfield, CO

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Connected to:

Hsing Chen Phones & Addresses

License #:

05379 - Expired

Category:

Chiropractic

Issued Date:

Mar 29, 1990

Expiration Date:

Apr 1, 2003

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Method Of Etching Molybdenum Metal From Substrates
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US Patent:

62212699, Apr 24, 2001
Filed:

Jan 19, 1999
Appl. No.:

9/233384
Inventors:

Krishna G. Sachdev - Hopewell Junction NY
Umar M. Ahmad - Hopewell Junction NY
Hsing H. Chen - Poughkeepsie NY
Lawrence D. David - Amherst NH
Charles H. Perry - Poughkeepsie NY
Donald R. Wall - Poughkeepsie NY
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

C03C 1500
US Classification:

216101
Abstract:

A method is provided for etching and removing extraneous molybdenum or debris on ceramic substrates such as semiconductor devices and also for molybdenum etching in the fabrication of molybdenum photomasks. The method employs a multi-step process using an acidic aqueous solution of a ferric salt to remove (etch) the molybdenum debris followed by contacting the treated substrate with an organic quaternary ammonium hydroxide to remove any molybdenum black oxides which may have formed on the exposed surface of treated molybdenum features in ceramic substrates. The method is environmentally safe and the waste solutions may be easily waste treated for example by precipitating the ferric salts as ferric hydroxide and removing anions such as sulfate by precipitation with lime. The method replaces the currently used method of employing ferricyanide salts which create serious hazardous waste disposal and environmental problems.

Corrosion Resistant Molybdenum Mask
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US Patent:

57442142, Apr 28, 1998
Filed:

Jan 30, 1997
Appl. No.:

8/792815
Inventors:

Peter Henry Berasi - Hopewell Junction NY
Hsing Hsiung Chen - Poughkeepsie NY
Assignee:

International Business Machines Corporation - Armonk NY
International Classification:

B32B 1504
B32B 310
US Classification:

428137
Abstract:

A molybdenum mask for use in the sputter deposition of electrically conductive materials on preselected areas of a substrate is coated with a transition metal carbide. The carbide protects the metal images defined on the mask from degradation during mask cleaning and related processes, thereby dramatically extending the usable service life of the mask. The present invention overcomes the problem of reduced usable life of a molybdenum mask used in sputter coating and similar evaporative deposition processing.