Hui Zheng

US Patent:

6682908, Jan 27, 2004

Filed:

Jun 13, 2001

Appl. No.:

09/743475

Inventors:

Roy G. Smith - Houston TX
Leonardus H. T. Van der Ploeg - Scotch Plains NJ
Andrew D. Howard - Park Ridge NJ
Hui Zheng - Houston TX
Karen Kulju McKee - Middletown NJ
Michael M. Jiang - Edison NJ

Assignee:

Merck Co., Inc. - Rahway NJ

International Classification:

C12N 510

US Classification:

435 691, 435 711, 4353201, 435471, 4352523, 435325, 530351, 536 235

Abstract:

A mouse growth hormone secretagogue receptor has been isolated, cloned and sequenced. This receptor is characteristic of the G-protein family of receptors. Mouse growth hormone secretagogue receptors may be used to screen and identify compoumds which bind to the mouse growth hormone secretagogue receptor. Such compounds may be used in the treatment of conditions which occur when there is a shortage of growth hormone, such as observed in growth hormone deficient children, elderly patients with musculoskeletal impairment and those recovering from hip fracture and osteoporosis. Targeted disruption of the mouse GHS-R gene may prove useful in elucidation of the mechanism of action and role of the growth hormone secretagogues in human and animal physiology.

US Patent:

6944006, Sep 13, 2005

Filed:

Apr 3, 2003

Appl. No.:

10/406889

Inventors:

Hui Zheng - San Jose CA, US
Kenneth Tsai - Redwood City CA, US
Hong Wang - Cupertino CA, US
Yongxiang He - Sunnyvale CA, US
Daniel M. Deyo - Cedar Park TX, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01T023/00

US Classification:

361234

Abstract:

A guard for an electrostatic chuck includes a ceramic annulus that has an inner surface shaped to fit around a circumference of the electrostatic chuck, and an outer surface having (i) a top portion with a recessed trench and (ii) a side portion. A metal coating is provided on the top portion of the outer surface.

US Patent:

8473876, Jun 25, 2013

Filed:

Jul 20, 2007

Appl. No.:

11/781054

Inventors:

Emre Tuncer - Santa Cruz CA, US
Hui Zheng - Round Rock TX, US
Vivek Raghavan - Mountain View CA, US
Anirudh Devgan - Austin TX, US
Amir Ajami - Sunnyvale CA, US
Alessandra Nardi - Hayward CA, US
Tao Lin - Sunnyvale CA, US
Pramod Thazhathethil - Bangalore, IN
Alfred Wong - Brookline MA, US

Assignee:

Synopsys, Inc. - Mountain View CA

International Classification:

G06F 17/50

US Classification:

716 54, 716 51, 716 55, 716113

Abstract:

A method for performing timing analysis includes receiving information specifying an integrated circuit. A neighborhood of shapes associated with the integrated circuit is then determined. Delay information associated with the integrated circuit is generated based on the neighborhood of shapes. The neighborhood of shapes may be determined by determining a first set of spacings to a boundary of a first cell from an internal shape. A second set of spacings may be determined from the boundary of the first cell to a shape of a second cell. A lithography process may be characterized using the first and second set of spacings.

US Patent:

8572523, Oct 29, 2013

Filed:

Jul 20, 2007

Appl. No.:

11/781043

Inventors:

Emre Tuncer - Santa Cruz CA, US
Hui Zheng - Round Rock TX, US
Vivek Raghavan - Mountain View CA, US
Anirudh Devgan - Austin TX, US
Amir Ajami - Sunnyvale CA, US
Alessandra Nardi - Hayward CA, US
Tao Lin - Sunnyvale CA, US
Pramod Thazhathethil - Bangalore, IN
Alfred Wong - Brookline MA, US

Assignee:

Synopsys, Inc. - Mountain View CA

International Classification:

G06F 17/50

US Classification:

716 55, 716 52, 716 53, 716 54, 716112, 716113, 716133, 716134, 716136, 703 16

Abstract:

A method for performing leakage analysis includes receiving information specifying an integrated circuit. A neighborhood of shapes associated with the integrated circuit is then determined. Leakage information associated with the integrated circuit is generated based on the neighborhood of shapes. The neighborhood of shapes may be determined by determining a first set of spacings to a boundary of a first cell from an internal shape. A second set of spacings may be determined from the boundary of the first cell to a shape of a second cell. A lithography process may be characterized using the first and second set of spacings.