Li Yu Chen

US Patent:

6720255, Apr 13, 2004

Filed:

Dec 12, 2002

Appl. No.:

10/318309

Inventors:

Richard A. Faust - Dallas TX
Noel M. Russell - Plano TX
Li Chen - Austin TX

Assignee:

Texas Instruments Incorporated - Dallas TX

International Classification:

H01L 214763

US Classification:

438637, 438765, 438798

Abstract:

A method ( ) of fabricating an electronic device ( ) formed on a semiconductor wafer. The method forms a dielectric layer ( ) in a fixed position relative to the wafer, where the dielectric layer comprises an atomic concentration of each of silicon, carbon, and oxygen. After the forming step, the method exposes ( ) the electronic device to a plasma such that the atomic concentration of carbon in a portion of the dielectric layer is increased and the atomic concentration of oxygen in a portion of the dielectric layer is decreased. After the exposing step, the method forms a barrier layer ( ) adjacent at least a portion of the dielectric layer.

US Patent:

20080153393, Jun 26, 2008

Filed:

Mar 12, 2007

Appl. No.:

11/716804

Inventors:

Linlin Chen - Plano TX, US
Li Chen - Dallas TX, US
Satyavolu Srinivas Papa Rao - Garland TX, US

International Classification:

B24B 1/00

US Classification:

451 37

Abstract:

A method for serially polishing a plurality of semiconductor wafers, wherein a CMP apparatus having a first polishing pad and a second polishing pad is provided. A first slurry composition is disposed between the first polishing pad and a first wafer when the first wafer is in a first state, and a first polishing on the first wafer via the first polishing pad and first slurry composition is commenced at a first commencement time. A second slurry composition is disposed between the second polishing pad and a second wafer when the second wafer is in a second state, and a second polishing on the second wafer via the second polishing pad and second slurry is commenced at a second commencement time, wherein the second commencement time differs from the first commencement time by a first intermediate period. One or more of the first wafer and the second wafer is rinsed with a pre-rinse agent for at least a portion of the first intermediate period. The first polishing and second polishing are halted at substantially the same end time, therein placing the first wafer in the second state and the second wafer in a third state.

US Patent:

20100009622, Jan 14, 2010

Filed:

Nov 2, 2007

Appl. No.:

12/446906

Inventors:

Li Chen - Dallas TX, US

International Classification:

H04H 20/71
H04M 1/00

US Classification:

455 301, 4555501

Abstract:

A system and method for ordering broadcast content using associated metadata. Metadata, which has been added to the broadcast transmission or otherwise transmitted is separated and transmitted to a personal communication device, preferably from the broadcast transmission receiver over a short-range radio frequency channel. The PCD uses the metadata to order the content from a content provider over a communications network and, if necessary, execute payment. The contact is then downloaded for storage and later use.

US Patent:

20120231537, Sep 13, 2012

Filed:

Mar 27, 2012

Appl. No.:

13/431359

Inventors:

Nancy Smyth Templeton - Houston TX, US
Li Chen - Plano TX, US

Assignee:

Gradalis, Inc. - Carrollton TX

International Classification:

C12N 15/63

US Classification:

4353201

Abstract:

The present disclosure generally relates to highly pure plasmid compositions having low, or undetectable, levels of colanic acid and other contaminants made by a process that comprises purifying plasmid DNA by chromatography, treating the purified plasmid DNA with a polypeptide that digests colanic acid under conditions that digest the colonic acid, and separating the plasmid DNA from the digested colonic acid.

US Patent:

20140074870, Mar 13, 2014

Filed:

Sep 13, 2012

Appl. No.:

13/613348

Inventors:

Paul Kenneth Bullis - Round Rock TX, US
Li Chen - Cary NC, US
Daniel P. Julin - New York NY, US
Carolyn Haibt Norton - Ann Arbor MI, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G06F 17/30

US Classification:

707755, 707758, 707E17005

Abstract:

An approach is provided in which a resolution manager stores a machine-readable problem, which includes a problem signature, and a human-readable solution in a document. The resolution manager receives an output file from a computer system and matches an output entry included in the output file to the problem signature. In turn, the resolution manager identifies the human-readable solution corresponding to the matched problem signature and provides the identified human-readable solution to the computer system.