James P Atkinson

US Patent:

6495000, Dec 17, 2002

Filed:

Jul 16, 2001

Appl. No.:

09/906590

Inventors:

James Mikel Atkinson - Camas WA
Hirohiko Nishiki - Nara, JP
Patrick L. Guthrie - Camas WA

Assignee:

Sharp Laboratories of America, Inc. - Camas WA

International Classification:

C23C 1434

US Classification:

20419212, 20429806, 20429811, 20429814, 20419226, 20419229

Abstract:

A system and method have been provided for an improved oxide deposition process using a DC sputtering magnetron. The invention prolongs the useful life of the anode by providing shielded electron collection surfaces, to minimize the deposition of insulator material on the anode. Specifically, the anode has a fin with a bottom electron collection surface that is shielded from the target material deposition. A small electro-magnet helps deflect the flow of electrons to the bottom surface of the fin. Vias in the fin promote the flow of electrons to the fin top surface, which is also shielded from the deposition material, even if deposition material begins to accumulate on the fin bottom surface.

US Patent:

6846688, Jan 25, 2005

Filed:

Mar 30, 2001

Appl. No.:

09/823521

Inventors:

Hirohiko Nishiki - Nara, JP
James Mikel Atkinson - Camas WA, US

Assignee:

Sharp Laboratories of America, Inc. - Camas WA

International Classification:

H01L 2184

US Classification:

438 30, 438158, 438609

Abstract:

A method of manufacturing a liquid crystal display (LCD) device and a novel LCD device structure are disclosed. In accordance with the preferred embodiment of the present invention, a photo-sensitive layer is formed over a substrate, followed by the formation of a photo-insensitive layer over the photo-sensitive layer. Then, a portion of the photo-sensitive layer is exposed via a photomask to a radiation source. Next, the portion of the photosensitive layer is contacted with a developing solution. At this time, the portion of the photo-sensitive layer is dissolved and the portion of the photo-insensitive layer overlying the portion of the photo-sensitive layer is removed concurrently. The present invention simplifies the LCD fabrication while decreasing the capacitance between a pixel electrode and bus lines.

US Patent:

20030106572, Jun 12, 2003

Filed:

Dec 12, 2001

Appl. No.:

10/020822

Inventors:

Hirohiko Nishiki - Tenri-shi, JP
James Atkinson - Camas WA, US
John Hartzell - Camas WA, US

International Classification:

B08B003/08

US Classification:

134/026000, 134/061000

Abstract:

A system and method have been provided for cleaning integrated circuit and liquid crystal display substrates of organic residue, such as photoresist, using a high concentrate ozonated water. Chilled water is used to increase the ozone concentration in the water to approximately 90 parts per million. The cleaning method is especially effective when used subsequent to an organic stripping process. The etching rates of the combined process are effective, and the use of the high concentrate ozonated water after the organic stripper also removes any contaminants on the substrate accumulated as a result of using the organic stripper.