James C Utter

US Patent:

6341808, Jan 29, 2002

Filed:

Jun 29, 2000

Appl. No.:

09/607137

Inventors:

Robert L. Baan - Wallkill NY
Richard J. Cassidy - Newburgh NY
Gerald Henry Leino - Walden NY
Raymond H. Turcotte - Hopewell Junction NY
James Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B25J 1506

US Classification:

294 641

Abstract:

Disclosed is a flexible sheet handling apparatus including a frame having a vacuum passage located around the periphery of the frame. There is also a porous, polymeric plug which covers the vacuum passage. When a vacuum is applied to the vacuum passage and the porous, polymeric plug, a flexible sheet in contact with the porous, polymeric plug is uniformly held only around the periphery of the flexible sheet by the applied vacuum.

US Patent:

6351871, Mar 5, 2002

Filed:

Jun 17, 1999

Appl. No.:

09/335420

Inventors:

Krishna G. Sachdev - Hopewell Junction NY
John T. Butler - Hopewell Junction NY
Michael E. Cropp - LaGrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
James N. Humenik - LaGrangeville NY
John U. Knickerbocker - Hopewell Junction NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
David E. Speed - Newton CT
Candace A. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

A47L 2500

US Classification:

15322, 510508, 134 63, 134 93, 134 953, 1341031

Abstract:

This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.

US Patent:

20010006116, Jul 5, 2001

Filed:

Jan 18, 2001

Appl. No.:

09/766011

Inventors:

James Blazick - Marlboro NY, US
Michael Cropp - LaGrangeville NY, US
James Humenik - LaGrangeville NY, US
Gerald Leino - Walden NY, US
Jawahar Nayak - Wappingers Falls NY, US
Frank Ranalli - Rhinebeck NY, US
Deborah Sylvester - Poughkeepsie NY, US
John Trumpetto - Hopewell Junction NY, US
James Utter - Fishkill NY, US
Rao Vallabhaneni - Hopewell Junction NY, US
Renne Weisman - Poughkeepsie NY, US

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H05K001/16

US Classification:

174/255000, 361/793000

Abstract:

A process of forming a multi-layer feature on a ceramic or organic article in which first and second layers of paste are sequentially screened through a screening mask wherein the screening mask has not been moved between screening steps. A structure produced by this process is also disclosed.

US Patent:

62387413, May 29, 2001

Filed:

Dec 7, 1998

Appl. No.:

9/206159

Inventors:

James M. Blazick - Marlboro NY
Michael E. Cropp - LaGrangeville NY
James N. Humenik - LaGrangevill NY
Gerald H. Leino - Walden NY
Jawahar P. Nayak - Wappingers Falls NY
Frank V. Ranalli - Rhinebeck NY
Deborah A. Sylvester - Poughkeepsie NY
John A. Trumpetto - Hopewell Junction NY
James C. Utter - Fishkill NY
Rao V. Vallabhaneni - Hopewell Junction NY
Renee L. Weisman - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05D 500

US Classification:

427282

Abstract:

A process of forming a multi-layer feature on a ceramic or organic article in which first and second layers of paste are sequentially screened through a screening mask wherein the screening mask has not been moved between screening steps. A structure produced by this process is also disclosed.

US Patent:

59163747, Jun 29, 1999

Filed:

Feb 9, 1998

Appl. No.:

9/021046

Inventors:

Jon A. Casey - Poughkeepsie NY
Michael E. Cropp - Lagrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
John U. Knickerbocker - Hopewell Junction NY
David C. Long - Wappingers Falls NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
Krishna G. Sachdev - Hopewell Junction NY
David E. Speed - Newtown CT
Candace A. Sullivan - Pleasant Valley NY
Robert J. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 304

US Classification:

134 37

Abstract:

A cleaning method and related apparatus for cleaning semiconductor screening masks using an aqueous alkali detergent solution applied under high pressure simultaneously from both sides of the mask, followed by a drying step that uses air knives to blow off the mask surface any residual cleaner solution.

US Patent:

60621354, May 16, 2000

Filed:

Dec 7, 1998

Appl. No.:

9/206158

Inventors:

Alvin W. Buechele - Clinton Corners NY
Karl O. Muggenburg - Salt Point NY
James C. Utter - Fishkill NY
Renee L. Weisman - Poughkeepsie NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B41M 112

US Classification:

101129

Abstract:

A screening apparatus including a table for holding an article; and a dual reservoir dispensing assembly. The dual reservoir assembly includes first and second reservoirs for holding first and second materials to be dispensed; first and second nozzles in communication with first and second reservoirs, respectively, for dispensing first and second materials; tilting apparatus for tilting the nozzles in a first direction so that the first nozzle is tilted into position for dispensing the first material and for tilting the nozzles in a second direction so that the first nozzle is tilted out of position and the second nozzle is tilted into position for dispensing the second material; and apparatus for moving the dual reservoir dispensing assembly with respect to the table wherein, in operation, the first nozzle is tilted into position during a first movement across the article and the second nozzle is titled into position during a second movement across the article.

US Patent:

58196528, Oct 13, 1998

Filed:

Dec 14, 1994

Appl. No.:

8/355886

Inventors:

James Clark Utter - Fishkill NY
Michael John Matts - Poughkeepsie NY
Ahmed Sayeed Shah - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B05C 1706

US Classification:

10112821

Abstract:

An improved mask for screening a conductive paste onto a microelectronic substrate is disclosed. The mask comprises a metal foil having a thickness of less than about 200 microns, having a stencil formed in the foil and extending inwardly to a first depth from a first exterior surface of the foil, said stencil comprising a plurality of voids corresponding to the desired pattern, and having a mesh formed in the foil and extending inwardly to a second depth from a second exterior surface of the foil opposite said first exterior surface, said mesh comprising a plurality of voids in communication with the voids of the stencil, wherein the ratio of said first depth to said second depth is less than 60:40, and wherein the mask is produced from an essentially homogenous metal sheet. Such masks are useful for fabricating microelectronic substrates having screened lines of conductive paste.

US Patent:

62805274, Aug 28, 2001

Filed:

Jun 12, 1998

Appl. No.:

9/096841

Inventors:

Krishna G. Sachdev - Hopewell Junction NY
John T. Butler - Hopewell Junction NY
Michael E. Cropp - LaGrangeville NY
Donald W. DiAngelo - Fishkill NY
John F. Harmuth - Pleasant Valley NY
James N. Humenik - LaGrangeville NY
John U. Knickerbocker - Hopewell Junction NY
Daniel S. Mackin - Pleasant Valley NY
Glenn A. Pomerantz - Kerhonkson NY
David E. Speed - Newtown CT
Candace A. Sullivan - Pleasant Valley NY
Bruce E. Tripp - Rhinebeck NY
James C. Utter - Fishkill NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

B08B 308
C23G 114

US Classification:

134 2

Abstract:

This invention relates to the cleaning of objects that relate to semiconductor printing, such as, for example, screening masks. This invention is basically directed to removing, for example, an organic polymer-metal composite paste from screening masks used in printing conductive metal patterns onto ceramic green sheets in the fabrication of semiconductor packaging substrates. More particularly, this invention is concerned with the automated in-line cleaning of paste screening masks with an aqueous alkaline solution of a quaternary ammonium hydroxide as a more environmentally friendly alternative to non-aqueous organic solvents-based cleaning in screening operations for the production multilayer ceramic (MLC) substrates.