Jason Thomas Reed

US Patent:

7512303, Mar 31, 2009

Filed:

Jun 27, 2007

Appl. No.:

11/769070

Inventors:

Benjamin F. Catching - Santa Rosa CA, US
Donald M. Friedrich - Windsor CA, US
Charles A. Hulse - Sebastopol CA, US
Marc K. Von Gunten - Los Altos CA, US
Jason Reed - West Hartford CT, US
Karl Kissa - West Simsbury CT, US
Glen Drake - Windsor CT, US
Julia Duncan - North Granby CT, US
William J. Minford - Windsor CT, US
Hiren V. Shah - Santa Rosa CA, US
Jerry Zieba - Santa Rosa CA, US
Jason Jiazhan Xu - Weatogue CT, US

Assignee:

JDS Uniphase Corporation - Milpitas CA

International Classification:

G02B 6/10

US Classification:

385131

Abstract:

The invention relates to a wafer scale process for the manufacture of optical waveguide devices, and particularly for the manufacture of ridge waveguide devices, and the improved waveguides made thereby. The present invention has found a process for achieving sub-micron control of an optical waveguiding layer thickness by providing a dimensionally stable wafer assembly into which adhesive can be introduced without altering the planar relationship between a carrier wafer and an optically transmissive wafer in wafer scale manufacture. This process permits wafer scale manufacture of optical waveguide devices including thin optically transmissive layers. A pattern of spacer pedestals is created by a deposition and etch back, or by a surface etch process to precisely reference surface information from a master surface to a carrier wafer to a thin optically transmissive wafer. The tolerance achievable in accordance with this process provides consistent yield across the wafer.

US Patent:

50544128, Oct 8, 1991

Filed:

Oct 31, 1989

Appl. No.:

7/429737

Inventors:

Jason C. Reed - Hampton VA
Dennis M. Bushnell - Hayes VA
Leonard M. Weinstein - Newport News VA

Assignee:

The United States of America as represented by the Administrator of the
National Aeronautics and Space Administration - Washington DC

International Classification:

B63B 138

US Classification:

114 67A

Abstract:

A process for reducing skin friction, inhibiting the effects of liquid turbulence, and decreasing heat transfer in a system involving flow of a liquid along a surface of a body includes applying a substantially integral sheet of a gas, e. g. , air, immediately adjacent to the surface of the body, e. g. , a marine vehicle, which has a longitudinally grooved surface in proximity with the liquid and with a surface material having high contact angle between the liquid and said wall to reduce interaction of the liquid, e. g. , water, with the surface of the body, e. g. , the hull of the marine vehicle.

US Patent:

54450950, Aug 29, 1995

Filed:

May 28, 1992

Appl. No.:

7/892066

Inventors:

Jason C. Reed - Hampton VA
Dennis M. Bushnell - Hayes VA

Assignee:

The United States of America as represented by the Administrator of the
National Aeronautics and Space Administration - Washington DC

International Classification:

B64C 138

US Classification:

114 67A

Abstract:

A process for reducing skin friction and inhibiting the effects of liquid turbulence in a system involving the flow of a liquid along the surface of a body, e. g. a marine vehicle, includes injecting a drag reducing polymer into the valleys of adjacent, evenly spaced, longitudinal grooves extending along the length of the surface of the body, so that the rate of diffusion of the polymer from individual grooves into the liquid flow is predictably controlled by the groove dimensions. When the polymer has diffused over the tips of the grooves into the near wall region of the boundary layer, the polymer effectively reduces the turbulent skin friction. A substantial drag reducing effect is achieved with less polymer than must be used to lower skin friction when the surface of the body is smooth.