Jeffrey Franklin Calvert

US Patent:

6436615, Aug 20, 2002

Filed:

Jun 25, 1999

Appl. No.:

09/339917

Inventors:

Susan L. Brandow - Springdale MD
Jeffrey M. Calvert - Alexandria VA
Walter M. Dressick - Fort Washington MD
Charles S. Dulcey - Washington DC

Assignee:

The United States of America as represented by the Secretary of the Navy - Washington DC

International Classification:

G03F 700

US Classification:

430324, 430296, 430325, 427304

Abstract:

An aspect of the present invention is a process for modifying a substrate in areas that are exposed to actinic radiation, having the steps: (a) providing on the substrate functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing at least a portion of the substrate to the actinic radiation, converting the functional groups in an exposed region of the substrate to the photoproducts; (c) contacting the photoproducts with a primary or secondary amine in the presence of hydrogen ions, forming imine groups; and (d) contacting the imine groups with a reducing agent, forming amine groups on the substrate in the exposed region. Another aspect of the present invention is a process for modifying a substrate in areas that are unexposed to actinic radiation, having the steps: (a) providing on the substrate aryl functional groups adapted for conversion to oxygen-containing photoproducts upon exposure to actinic radiation; (b) exposing a portion of the substrate to the actinic radiation, converting the aryl functional groups in an exposed region of the substrate to the photoproducts, and not converting the aryl functional groups in an unexposed region of the substrate to the photoproducts; (c) contacting the aryl functional groups in the unexposed region of the substrate with a compound adapted for physisorption to the aryl functional groups, preferentially physisorbing the compound onto the substrate in the unexposed regions.

US Patent:

56886420, Nov 18, 1997

Filed:

Dec 1, 1994

Appl. No.:

8/352126

Inventors:

Linda A. Chrisey - Bowie MD
Walter J. Dressick - Ft. Washington MD
Jeffrey M. Calvert - Alexandria VA

Assignee:

The United States of America as represented by the Secretary of the Navy - Washington DC

International Classification:

C12Q 168
C12Q 170
C12P 1934
C07H 2104

US Classification:

435 6

Abstract:

Patterns of pre-formed hybridizable nucleic acid oligomers are formed upon a substrate. The substrate is coated with molecules, such as aminosilanes, whose reactivity with nucleic acid molecules can be transformed by irradiation. The coated substrate exposed to patterned irradiation then contacted with pre-formed nucleic acid oligomers. The binding of the preformed nucleic acid oligomers to the coating molecules may be covalent or non-covalent (for example, ionic bonding or hydrogen bonding). If desired, a heterobifunctional crosslinker may be employed, before or after irradiation, with the coating to promote covalent binding of the nucleic acid oligomers to the coating molecules. Also, the irradiation step may be performed with the assistance of a positive-tone or negative-tone photoresist.

US Patent:

56482019, Jul 15, 1997

Filed:

Dec 16, 1992

Appl. No.:

7/991680

Inventors:

Charles S. Dulcey - Washington DC
Timothy S. Koloski - Ft. Washington MD
Walter J. Dressick - Ft. Washington MD
Jeffrey M. Calvert - Alexandria VA
Brian M. Peek - Annandale VA

Assignee:

The United Sates of America as represented by the Secretary of the Navy - Washington DC

International Classification:

G03C 500
G03C 1492
B05D 304
B05D 118

US Classification:

430324

Abstract:

A process for efficient modification and metallization of substrates includes the steps of providing a substrate with highly photoefficient chemical functional groups on at least a portion of this substrate, exposing the substrate to actinic radiation to transform, deactivate, or remove these chemical functional groups, to modify their chemical reactivity, and carrying out further chemical reaction steps on these modified chemical functional groups.