Jeffrey T Ellison

US Patent:

20080202687, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711492

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

H01L 21/306

US Classification:

15634532

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. At least two of the process chamber modules are horizontally clustered around the substrate transfer chamber. In addition, at least two of the process chamber modules are vertically arranged with one process chamber module above the other process chamber module. The substrate transfer chamber includes one or more robotic arms for transferring flat-panel display substrates between the substrate load lock chamber and the plurality of process chamber modules.

US Patent:

20080202892, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711458

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

H01L 21/677

US Classification:

198348, 118 50, 432239, 901 15

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. At least two of the process chamber modules are horizontally clustered around the substrate transfer chamber. In addition, at least two of the process chamber modules are vertically arranged with one process chamber module above the other process chamber module. The substrate transfer chamber includes one or more robotic arms for transferring semiconductor substrates between the substrate load lock chamber and the plurality of process chamber modules.

US Patent:

20080206020, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711484

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

B25J 1/00

US Classification:

414 1, 901 2, 901 30

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A plurality of storage bays may be used to store flat-panel display substrates. A first set of one or more multi-axis robot arms may transfer one or more flat-panel display substrates between the substrate load lock chamber and the plurality of storage bays. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. A second set of one or more multi-axis robot arms may transfer flat-panel display substrates between the storage bays and the plurality of process chamber modules under sub-atmospheric conditions.

US Patent:

20080206021, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711472

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

H01L 21/677

US Classification:

414217

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. At least two of the process chamber modules are horizontally clustered around the substrate transfer chamber. In addition, at least two of the process chamber modules are vertically arranged with one process chamber module above the other process chamber module. The substrate transfer chamber includes one or more robotic arms for transferring magnetic media substrates between the substrate load lock chamber and the plurality of process chamber modules.

US Patent:

20080206022, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711473

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

H01L 21/677

US Classification:

4142171, 901 2

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. One or more multi-axis robot arms in the substrate transfer chamber may transfer semiconductor substrates between the load lock chamber and the plurality of process chamber modules under sub-atmospheric conditions.

US Patent:

20080206023, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711476

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

H01L 21/677

US Classification:

4142171, 901 2

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A plurality of storage bays may be used to store semiconductor substrates. A first set of one or more multi-axis robot arms may transfer one or more semiconductor substrates between the substrate load lock chamber and the plurality of storage bays. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. A second set of one or more multi-axis robot arms may transfer semiconductor substrates between the storage bays and the plurality of process chamber modules under sub-atmospheric conditions.

US Patent:

20080206036, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711464

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

B65G 57/00

US Classification:

414788

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A plurality of storage bays may be used to store magnetic media substrates. A first set of one or more multi-axis robot arms may transfer one or more magnetic media substrates between the substrate load lock chamber and the plurality of storage bays. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. A second set of one or more multi-axis robot arms may transfer magnetic media substrates between the storage bays and the plurality of process chamber modules under sub-atmospheric conditions.

US Patent:

20080202410, Aug 28, 2008

Filed:

Feb 27, 2007

Appl. No.:

11/711502

Inventors:

John M. Smith - Austin TX, US
James Carter Hall - Georgetown TX, US
Jeffrey G. Ellison - Austin TX, US

International Classification:

C23C 14/56

US Classification:

118 50

Abstract:

A substrate processing apparatus is described. The apparatus includes a substrate load lock chamber. A substrate transfer chamber is vacuum coupled to the substrate load lock chamber. A plurality of process chamber modules are vacuum coupled to the substrate transfer chamber. The apparatus may process semiconductor substrates with a selected diameter in a range from about 100 mm to about 450 mm.