Jeffrey H Hoffman

US Patent:

51199726, Jun 9, 1992

Filed:

Dec 28, 1989

Appl. No.:

7/458332

Inventors:

David Reed - Nutley NJ
Frank D. Tenne - Ivyland PA
Patrick D. Holverson - Ahwatukee AZ
Jeffrey A. Hoffman - Westerville OH

Assignee:

American Cyanamid Company - Stamford CT

International Classification:

B67D 560

US Classification:

222143

Abstract:

The present invention provides a container for use in a closed application system for liquid or granular agricultural treatment agents. The agent is introduced into the container through an inlet opening on the upper surface of the container. Thereafter, a valve is removably mounted to seal the inlet opening and prevent inadvertant discharge of the liquid from the container. Hand grips are provided to manipulate the container, and the container is configured so that it nested or stacked on other similar containers having valves extending from the respective inlet openings when the containers are transported in an upright position. The handgrips are also employed to mount the containers in an inverted position in agricultural application equipment. Empty containers may be transported back to a supply station for refilling with the valves of the respective containers still mounted in the inlet openings to seal the openings and prevent inadvertant discharge or leakage of residue liquid or granular treatment agents still remaining in the containers. The reusable containers enable the agricultural treatment agents to be transported between a supply station and application equipment without any direct exposure to the user.

US Patent:

63121344, Nov 6, 2001

Filed:

Jan 23, 1999

Appl. No.:

9/230438

Inventors:

Kanti Jain - Briarcliff NY
Thomas J. Dunn - Mohegan Lake NY
Jeffrey M Hoffman - Sierra Madre CA

Assignee:

Anvik Corporation - Hawthorne NY

International Classification:

G02B 7182
G03B 2770
G03B 2754
G03B 2772

US Classification:

359855

Abstract:

The invention is a seamless projection lithography system that eliminates the need for masks through the use of a programmable Spatial Light Modulator (SLM) with high parallel processing power. Illuminating the SLM with a radiation source (1), which while preferably a pulsed laser may be a shuttered lamp or multiple lasers with alternating synchronization, provides a patterning image of many pixels via a projection system (4) onto a substrate (5). The preferred SLM is a Deformable Micromirror Device (3) for reflective pixel selection using a synchronized pulse laser. An alternative SLM is a Liquid Crystal Light Valve (LCLV) (45) for pass-through pixel selection. Electronic programming enables pixel selection control for error correction of faulty pixel elements. Pixel selection control also provides for negative and positive imaging and for complementary overlapping polygon development for seamless uniform dosage. The invention provides seamless scanning by complementary overlapping scans to equalize radiation dosage, to expose a pattern on a large area substrate (5).

US Patent:

57106193, Jan 20, 1998

Filed:

Oct 31, 1995

Appl. No.:

8/551134

Inventors:

Kanti Jain - Briarclill Manor NY
Jeffrey M. Hoffman - Stamford CT

Assignee:

Anvik Corporation - Hawthorne NY

International Classification:

H01L 2130
G03B 2752

US Classification:

355 50

Abstract:

In numerous applications of large-area patterning systems, the preferred image magnification is unity. However, in some applications, the size of the substrate may change slightly due to various thermal and/or chemical processing steps. To compensate for scale changes of the substrate, the magnification of the imaging system must vary slightly from unit magnification (typically by a fraction of a percentage) so that a layer already patterned on the substrate will have, after processing, proper image registration with the subsequent layer. This disclosure describes a lithography system for exposing large substrates at high imaging resolution and high exposure throughput, and specifically relates to a scan-and-repeat patterning system that employs a unitary mask-substrate stage and enables projection imaging of a substrate with capability to control the image magnification to compensate for changes of substrate dimensions occurring as a result of previous process steps. A combination of optical and mechanical compensation is used to provide the necessary magnification control, including anamorphic magnification variation in which the fine adjustment is of different magnitudes in x and y dimensions. The optical control is provided by a projection lens with anamorphic magnification adjustment capability.

US Patent:

54734088, Dec 5, 1995

Filed:

Jul 1, 1994

Appl. No.:

8/269670

Inventors:

Jeffrey M. Hoffman - Stamford CT
Kanti Jain - Briarcliff Manor NY

Assignee:

Anvik Corporation - Elmsford NY

International Classification:

G03B 2742

US Classification:

355 53

Abstract:

A system is described for recycling radiation reflected by an illuminated patterning mask in a via-hole drilling or exposure tool. The mask is illuminated by high-energy laser radiation, and the illuminated region is imaged onto a substrate by a projection, proximity, or contact method. The source radiation is suitably shaped by a lens assembly and focused into an optical intensity homogenizer with the desired numerical aperture. The homogenizer has the base function of converting the focused beam to self-luminous light required for drilling of via-holes or other processes accomplished by the tool, while maintaining the numerical aperture of the beam. The homogenizer also participates in the radiation-recycling function. An apertured reflector allows radiation from the source to enter the homogenizer. The radiation passing through and exiting the homogenizer is image by a lens to illuminate a portion of the mask.

US Patent:

56966318, Dec 9, 1997

Filed:

Feb 22, 1996

Appl. No.:

8/605426

Inventors:

Jeffrey M. Hoffman - White Plains NY

Assignee:

Anvik Corporation - Hawthorne NY

International Classification:

G02B 300
G02B 1322

US Classification:

359649

Abstract:

A unit magnification lens system suitable for imaging of features in photoresist designed for exposure at a wavelength of 248. 4 nm using a krypton fluoride excimer laser. This lens system is characterized by a very long working distance in the object and image spaces to allow incorporation of minors in the imaging path. The optical system is refractive, telecentric, and symmetrical about the central aperture stop.

US Patent:

20170341525, Nov 30, 2017

Filed:

Aug 17, 2017

Appl. No.:

15/679887

Inventors:

- Long Island NY, US
Cody Rickman - Brooklyn NY, US
Azra Horowitz - Long Island City NY, US
Yelizaveta Kholodkova - Gainesville FL, US
Tome Rey Verissimo - Cambridgeshire, GB
Jeffrey Hoffman - New York NY, US

International Classification:

B60L 11/18

Abstract:

The Anti-idling System for Ambulances and Other Vehicles is a novel system for making electricity available to vehicles which idle curbside in urban and suburban environments. The invention comprises a pedestal with a specialized electricity plug, a cord and cord reel, an onboard microcontroller with GSM and RFID card reader which controls the flow of electricity and communicates with a cloud-based management system, and a cloud-based management system which controls user authentication. This enables an ambulance or other vehicle operator to approach the pedestal, access the plug and cord and turn on the flow of electricity using an RFID card or mobile phone, and use the pedestal to power their vehicle while in proximity to the pedestal. When the vehicle engine is started, the system detects the auto-ejection of the plug from the vehicle, turns off the flow of electricity, and automatically retracts the plug and cord into the pedestal.

US Patent:

20160059804, Mar 3, 2016

Filed:

Sep 2, 2014

Appl. No.:

14/474842

Inventors:

- Queens NY, US
Cody Rickman - Brooklyn NY, US
Azra Horowitz - Long Island City NY, US
Yelizaveta Kholodkova - Gainesville FL, US
Tomé Rey Veríssimo - Cambridgeshire, GB
Jeffrey Hoffman - New York NY, US

International Classification:

B60R 16/03

Abstract:

The Anti-idling System for Ambulances and Other Vehicles is a novel system for making electricity available to vehicles which idle curbside in urban and suburban environments. The invention comprises a pedestal with a specialized electricity plug, a cord and cord reel, an onboard microcontroller with GSM and RFID card reader which controls the flow of electricity and communicates with a cloud-based management system, and a cloud-based management system which controls user authentication. This enables an ambulance or other vehicle operator to approach the pedestal, access the plug and cord and turn on the flow of electricity using an RFID card or mobile phone, and use the pedestal to power their vehicle while in proximity to the pedestal. When the vehicle engine is started, the system detects the auto-ejection of the plug from the vehicle, turns off the flow of electricity, and automatically retracts the plug and cord into the pedestal.

US Patent:

20150013497, Jan 15, 2015

Filed:

Oct 3, 2014

Appl. No.:

14/505773

Inventors:

- New Orleans LA, US
Jeffrey J. Hoffman - Chappaqua NY, US

International Classification:

C21B 3/00
C21B 11/00

US Classification:

75375, 75507

Abstract:

A process for recovering iron/steel from scrap mill scales and fines is disclosed. A process in accordance with embodiments of the present invention comprises mixing mill scales and fines with coke or other carbon containing fines and sealing the mixture in a container. The container is charged into a cupola or blast furnace, where the components react to form molten iron/steel. The recovery process in accordance with an embodiment of the present invention is performed integral to cupola or blast furnace operations and the recovered metal is collected at the base of the furnace as molten iron/steel.