Jie Lin
age ~54
from Des Moines, WA
- Also known as:
-
- Grdn Chin Lin
- Lin S Jie
Jie Lin Phones & Addresses
- Des Moines, WA
- Reston, VA
- Lake Oswego, OR
- 43575 Popes Creek Sq, Leesburg, VA 20176 • (571)3337988
- 19265 Citrine Dr, Leesburg, VA 20176
- Fredericksburg, VA
- Staten Island, NY
- Kiona, WA
Work
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Company:Nordstrom bellevue squareJul 2014
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Position:Sales associate
Education
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School / High School:University of Washington- Bothell, WADec 2014
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Specialities:Bachelor of Arts in Business Administration
Name / Title
Company / Classification
Phones & Addresses
LIN EASTGATE, INC
YJ MIDWAY, INC
DSOLIDWOOD KITCHEN CABINETS, LLC
LIN RIVER VALLEY, INC
CM MIDWAY, INC
CE MIDWAY, INC
OHYJ MIDWAY, INC
OHYJ RIVER VALLEY, INC
Vehicle Records
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Jie Lin
view source -
Address:12870 Williams Mdw Ct, Herndon, VA 20171
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VIN:1HGCM56827A183144
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Make:HONDA
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Model:ACCORD
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Year:2007
Resumes
Research Data Specialist
view sourceLocation:
Seattle, WA
Work:
Weill Cornell Medical College
Research Data Specialist
Research Data Specialist
Education:
Cornell University
University of Washington
University of Washington
Software Engineer
view sourceLocation:
Seattle, WA
Industry:
Computer Software
Work:
Google
Software Engineer
Amazon 2012 - 2017
Software Development Engineer
Software Engineer
Amazon 2012 - 2017
Software Development Engineer
Education:
Cornell University 2011 - 2012
Masters, Computer Science Cornell University 2010 - 2011
Bachelors, Bachelor of Science, Computer Science Stuyvesant High School 2006 - 2010
Nanjing University 2006 - 2010
Bachelor of Engineering, Bachelors, Software Engineering
Masters, Computer Science Cornell University 2010 - 2011
Bachelors, Bachelor of Science, Computer Science Stuyvesant High School 2006 - 2010
Nanjing University 2006 - 2010
Bachelor of Engineering, Bachelors, Software Engineering
Skills:
C++
C
Java
Python
Shell Scripting
Machine Learning
Nlp
Embedded Systems
Functional Programming
Ocaml
Scala
Software Development
Sql
Javascript
Requirements Analysis
Business Analysis
Technical Support
Linux
Algorithms
Mysql
Eclipse
Software Engineering
Html
Hadoop
Perl
Matlab
C
Java
Python
Shell Scripting
Machine Learning
Nlp
Embedded Systems
Functional Programming
Ocaml
Scala
Software Development
Sql
Javascript
Requirements Analysis
Business Analysis
Technical Support
Linux
Algorithms
Mysql
Eclipse
Software Engineering
Html
Hadoop
Perl
Matlab
Languages:
English
Mandarin
Mandarin
Jie Lin
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Jie Lin
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Jie Lin
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Jie Lin
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Jie Lin
view sourceSkills:
Microsoft Word
Powerpoint
English
Negotiation
Customer Service
Sales Management
Powerpoint
English
Negotiation
Customer Service
Sales Management
Jie Lin
view sourceLocation:
United States
Us Patents
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Polishing Composition
view source -
US Patent:20050139119, Jun 30, 2005
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Filed:Dec 24, 2003
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Appl. No.:10/746779
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Inventors:W. Rader - Sherwood OR, US
Jie Lin - Lake Oswego OR, US -
International Classification:C09G001/00
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US Classification:106003000
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Abstract:A polishing composition of the present invention includes alumina, colloidal silica, citric acid, an organic acid other than citric acid, an oxidizing agent, and water. When the polishing composition is used in polishing the surface of a substrate for a magnetic disk, the substrate is polished at a high rate, and the substrate after polishing has reduced surface defects.
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Polishing Composition And Polishing Method
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US Patent:20070068902, Mar 29, 2007
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Filed:Sep 29, 2005
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Appl. No.:11/238256
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Inventors:Yasushi Matsunami - Gifu-shi, JP
Junichi Hirano - Nagoya-shi, JP
Jie Lin - Tualatin OR, US -
International Classification:B44C 1/22
C09K 13/00
C03C 15/00 -
US Classification:216088000, 252079100, 216022000
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Abstract:A polishing composition contains abrasive grain such as colloidal silica, acid such as citric acid and orthophosphoric acid, an oxidizing agent such as hydrogen peroxide, a compound selected from a group consisting of azoles and its derivatives such as benzotriazole. The polishing composition is suitably used for polishing a magnetic disk substrate.
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Polishing Composition And Polishing Method
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US Patent:20080003928, Jan 3, 2008
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Filed:Sep 14, 2007
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Appl. No.:11/855665
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Inventors:Yasushi Matsunami - Gifu-shi, JP
Junichi Hirano - Nagoya-shi, JP
Jie Lin - Tualatin OR, US -
International Classification:B24B 7/00
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US Classification:451060000
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Abstract:A polishing composition contains abrasive grain such as colloidal silica, acid such as citric acid and orthophosphoric acid, an oxidizing agent such as hydrogen peroxide, a compound selected from a group consisting of azoles and its derivatives such as benzotriazole. The polishing composition is suitably used for polishing a magnetic disk substrate.
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Polishing Composition Based On Mixture Of Colloidal Silica Particles
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US Patent:20210301173, Sep 30, 2021
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Filed:Mar 30, 2020
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Appl. No.:16/834334
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Inventors:- Kiyosu-shi, JP
Jie LIN - Tualatin OR, US -
Assignee:FUJIMI INCORPORATED - Kiyosu-shi
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International Classification:C09G 1/02
C09K 3/14
B24B 37/04 -
Abstract:Provided herein are compositions comprising a first colloidal silica particle that is not surface-modified and a second colloidal silica particle that is surface modified to carry a negative charge. Also provided herein are methods for selectively removing HfOor SiOfrom a surface.
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Polishing Composition Containing Zirconia Particles And An Oxidizer
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US Patent:20210269673, Sep 2, 2021
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Filed:Feb 28, 2020
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Appl. No.:16/805037
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Inventors:- Tualatin OR, US
Jie Lin - Tualatin OR, US -
Assignee:FUJIMI CORPORATION - Tualatin OR
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International Classification:C09G 1/02
H01L 21/3105 -
Abstract:Provided herein are compositions and methods for polishing surfaces comprising amorphous carbon, spin-on carbon (SoC), and/or diamond like carbon (DLC) films.
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Polishing Composition Containing Zirconia Particles And An Oxidizer
view source -
US Patent:20210269674, Sep 2, 2021
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Filed:Nov 20, 2020
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Appl. No.:17/100072
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Inventors:- Tualatin OR, US
Jie Lin - Tualatin OR, US -
Assignee:FUJIMI CORPORATION - Tualatin OR
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International Classification:C09G 1/02
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Abstract:Provided herein are CMP compositions, and methods for polishing surfaces comprising amorphous carbon, spin-on carbon (SoC), and/or diamond like carbon (DLC) films. The CMP compositions of the present disclosure contain at least one abrasive having zirconia particles and may also contain at least one metal-containing oxidizer.
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Composition For Selective Polishing Of Work Function Metals
view source -
US Patent:20200087538, Mar 19, 2020
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Filed:Sep 14, 2018
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Appl. No.:16/132197
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Inventors:- Tualatin OR, US
Jie LIN - Tualatin OR, US -
Assignee:FUJIMI CORPORATION - Tualatin OR
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International Classification:C09G 1/02
H01L 21/306 -
Abstract:Provided herein are methods and compositions for selective polishing of a work function metal containing substrate. The present methods and compositions involve the use of a liquid carrier an anionic surfactant and a colloidal silica particle. The present methods and compositions can be used to achieve selective polishing of the work function metal.
Myspace
Youtube
Jie Lin
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Jie Wen Lin
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Jie Lin
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Jie Lin Wang
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Tan Jie Lin
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Zheng Jie Lin
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Jie Lin
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Jie Linn Lin
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lin jie
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Classmates
Jie Lin
view sourceSchools:
New York High School For Economic & Finance New York NY 1997-2001
Jie Lin
view sourceSchools:
New York High School For Economic & Finance New York NY 1997-2001
New York High School For ...
view sourceGraduates:
Jie Liu (2002-2006),
Jie Lin (1997-2001),
Jasmine Johnson (1997-2001),
Elizabeth Paulino (1995-1999)
Jie Lin (1997-2001),
Jasmine Johnson (1997-2001),
Elizabeth Paulino (1995-1999)
Googleplus
Jie Lin
Education:
Dalian University of Technology, University of Alberta
Jie Lin
Relationship:
In_a_relationship
About:
大帥哥
Jie Lin
Jie Lin
Education:
University of Virginia - Biochemisty and molecular genetics
Jie Lin
Jie Lin
Jie Lin
Jie Lin
Get Report for Jie Lin from Des Moines, WA, age ~54