Jin Min Sung

US Patent:

7297616, Nov 20, 2007

Filed:

Apr 9, 2004

Appl. No.:

10/822225

Inventors:

James F. Cameron - Cambridge MA, US
Peter Trefonas, III - Medway MA, US
George G. Barclay - Jefferson MA, US
Jin Wuk Sung - Worcester MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

H01L 21/425

US Classification:

438514, 257 21021

Abstract:

New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.

US Patent:

7326518, Feb 5, 2008

Filed:

Nov 23, 2005

Appl. No.:

11/287104

Inventors:

James F. Cameron - Cambridge MA, US
Dong Woo Lee - Shrewsbury MA, US
Peter Trefonas, III - Medway MA, US
Gary J. Swanson - Bellingham MA, US
Jin Wuk Sung - Northborough MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03C 1/492
G03C 1/494
G03C 1/76
G03C 5/00

US Classification:

4302701, 430905, 430910, 430913, 430326

Abstract:

Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprise one or more photoacid-labile acetal groups and one or more alicyclic groups such as adamantyl.

US Patent:

20060172223, Aug 3, 2006

Filed:

Nov 23, 2005

Appl. No.:

11/287103

Inventors:

James Cameron - Cambridge MA, US
Su Kang - Grafton MA, US
Jin Sung - Northborough MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03C 1/76

US Classification:

430270100

Abstract:

Chemically-amplified positive photoresist compositions are provided that contain an additive with acetal and alicyclic groups. Preferred photoresists of the invention comprise a resin component that includes a polymer with one or more photoacid-labile moieties, one or more photoacid generator compounds, and an additive that contains one or more alicyclic groups such as adamantyl and the like.

US Patent:

20080220597, Sep 11, 2008

Filed:

Oct 31, 2007

Appl. No.:

11/981623

Inventors:

James F. Cameron - Cambridge MA, US
Peter Trefonas - Medway MA, US
George G. Barclay - Jefferson MA, US
Jin Wuk Sung - Worcester MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

H01L 21/425

US Classification:

438530, 257E21473

Abstract:

New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.

US Patent:

20090148789, Jun 11, 2009

Filed:

Nov 12, 2008

Appl. No.:

12/291641

Inventors:

John P. Amara - Charlestown MA, US
Nicola Pugliano - Grafton MA, US
Jin Wuk Sung - Worcester MA, US
Michael K. Gallagher - Hopkinton MA, US
Michael S. Castorano - Leominster MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/20
G03F 7/004

US Classification:

4302701, 430326

Abstract:

In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.

US Patent:

20100297556, Nov 25, 2010

Filed:

Feb 8, 2010

Appl. No.:

12/658614

Inventors:

James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
John P. Amara - Reading MA, US
Gregory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/004
G03F 7/20
C08G 73/10
C07D 487/08

US Classification:

4302711, 430325, 528367, 548417

Abstract:

Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.

US Patent:

20100297557, Nov 25, 2010

Filed:

Feb 8, 2010

Appl. No.:

12/658615

Inventors:

James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
John P. Amara - Reading MA, US
Greogory P. Prokopowicz - Worcester MA, US
David A. Valeri - Leominster MA, US
Libor Vyklicky - Yorktown Heights NY, US
Wenjie Li - Poughkeepsie NY, US
Pushkara R. Varanasi - Poughkeepsie NY, US
Irene Y. Popova - Beacon NY, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/004
C08G 73/10

US Classification:

4302711, 528322

Abstract:

Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.

US Patent:

20110003250, Jan 6, 2011

Filed:

Jun 10, 2010

Appl. No.:

12/813228

Inventors:

John P. Amara - Reading MA, US
James F. Cameron - Cambridge MA, US
Jin Wuk Sung - Northborough MA, US
Gregory P. Prokopowicz - Worcester MA, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

G03F 7/20
G03F 7/004
C07C 63/36
C08L 67/00

US Classification:

4302711, 562467, 524599, 430326

Abstract:

In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.