James F. Cameron - Cambridge MA, US Peter Trefonas, III - Medway MA, US George G. Barclay - Jefferson MA, US Jin Wuk Sung - Worcester MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
H01L 21/425
US Classification:
438514, 257 21021
Abstract:
New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
James F. Cameron - Cambridge MA, US Dong Woo Lee - Shrewsbury MA, US Peter Trefonas, III - Medway MA, US Gary J. Swanson - Bellingham MA, US Jin Wuk Sung - Northborough MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03C 1/492 G03C 1/494 G03C 1/76 G03C 5/00
US Classification:
4302701, 430905, 430910, 430913, 430326
Abstract:
Chemically-amplified positive photoresist compositions are provided that contain a resin that comprises acetal and alicyclic groups. Photoresists of the invention can exhibit notably enhanced lithographic properties. Preferred photoresists of the invention comprise one or more photoacid generator compounds and one or more phenolic resins comprise one or more photoacid-labile acetal groups and one or more alicyclic groups such as adamantyl.
James Cameron - Cambridge MA, US Su Kang - Grafton MA, US Jin Sung - Northborough MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03C 1/76
US Classification:
430270100
Abstract:
Chemically-amplified positive photoresist compositions are provided that contain an additive with acetal and alicyclic groups. Preferred photoresists of the invention comprise a resin component that includes a polymer with one or more photoacid-labile moieties, one or more photoacid generator compounds, and an additive that contains one or more alicyclic groups such as adamantyl and the like.
James F. Cameron - Cambridge MA, US Peter Trefonas - Medway MA, US George G. Barclay - Jefferson MA, US Jin Wuk Sung - Worcester MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
H01L 21/425
US Classification:
438530, 257E21473
Abstract:
New photoresists are provided that can be applied and imaged with reduced undesired outgassing and/or as thick coating layers. Preferred resists of the invention are chemically-amplified positive-acting resists that contain photoactive and resin components.
Coating Compositions For Use With An Overcoated Photoresist
John P. Amara - Charlestown MA, US Nicola Pugliano - Grafton MA, US Jin Wuk Sung - Worcester MA, US Michael K. Gallagher - Hopkinton MA, US Michael S. Castorano - Leominster MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/20 G03F 7/004
US Classification:
4302701, 430326
Abstract:
In one aspect, the invention relates to silicon-containing organic coating compositions, particularly antireflective coating compositions, that contain a repeat unit wherein chromophore moieties such as phenyl are spaced from Si atom(s). In another aspect, silicon-containing underlayer compositions are provided that are formulated as a liquid (organic solvent) composition, where at least one solvent of the solvent component comprise hydroxy groups.
Coating Compositions Suitable For Use With An Overcoated Photoresist
James F. Cameron - Cambridge MA, US Jin Wuk Sung - Northborough MA, US John P. Amara - Reading MA, US Gregory P. Prokopowicz - Worcester MA, US David A. Valeri - Leominster MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/004 G03F 7/20 C08G 73/10 C07D 487/08
US Classification:
4302711, 430325, 528367, 548417
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Coating Compositions Suitable For Use With An Overcoated Photoresist
James F. Cameron - Cambridge MA, US Jin Wuk Sung - Northborough MA, US John P. Amara - Reading MA, US Greogory P. Prokopowicz - Worcester MA, US David A. Valeri - Leominster MA, US Libor Vyklicky - Yorktown Heights NY, US Wenjie Li - Poughkeepsie NY, US Pushkara R. Varanasi - Poughkeepsie NY, US Irene Y. Popova - Beacon NY, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/004 C08G 73/10
US Classification:
4302711, 528322
Abstract:
Organic coating compositions, particularly antireflective coating compositions, are provided that can be developed with an aqueous alkaline developer, including in a single step during development of an overcoated photoresist layer. Preferred coating compositions comprise a tetrapolymer that comprises at least four distinct functional groups.
Coating Compositions Suitable For Use With An Overcoated Photoresist
John P. Amara - Reading MA, US James F. Cameron - Cambridge MA, US Jin Wuk Sung - Northborough MA, US Gregory P. Prokopowicz - Worcester MA, US
Assignee:
Rohm and Haas Electronic Materials LLC - Marlborough MA
International Classification:
G03F 7/20 G03F 7/004 C07C 63/36 C08L 67/00
US Classification:
4302711, 562467, 524599, 430326
Abstract:
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Functional Chiropractic
President
Bni 2004 - 2006
Member
Functional Chiropractic 2004 - 2006
Owner
Education:
New York Chiropractic College 1993 - 1997
Doctorates, Doctor of Chiropractic
Binghamton University 1989 - 1992
Bachelors, Bachelor of Science, Management
Skills:
Pain Management Sports Injuries Chiropractic Nutritional Counseling Nutrition Therapeutic Massage Functional Medicine Neck Pain Injury Chronic Illness Wellness Neurology Athletics Lifestyle Healing Sports Medicine Stress Graston Technique Prevention Sciatica Wellness Coaching Chronic Pain Holistic Health Wellbeing Alternative Medicine Back Pain Fitness Myofascial Release Migraine Low Back Pain Physical Therapy Fibromyalgia Headaches Spine Musculoskeletal Supplements Rehabilitation
Interests:
Family Chiropractic Mix Marital Arts Yankees Golf Fishing
"Inventory buildup stemming from weak demand will push components prices to lower-than-anticipated levels during the first half of 2016," KTB Securities analyst Jin Sung-hye said in a report, cutting a 2016 profit forecast for Samsung to 24.2 trillion won from 25.4 trillion won previously.
topped market estimates...because there were few products in the market that can match Galaxy S II as Apple appears to be delaying new iPhone debut due to disruptions in parts supply, while Nokia continues to fail to introduce competitive lineups," said Jin Sung-hye, an analyst at Hyundai Securities.