Jingping P Peng

US Patent:

7799132, Sep 21, 2010

Filed:

Dec 13, 2007

Appl. No.:

11/955845

Inventors:

John N. Randall - Richardson TX, US
Jingping Peng - Plano TX, US
George D. Skidmore - Richardson TX, US
Christof Baur - Dallas TX, US
Richard E. Stallcup - Little Elm TX, US
Robert J. Folaron - Plano TX, US

Assignee:

Zyvex Labs, LLC - Richardson TX

International Classification:

C30B 25/04

US Classification:

117 84, 117 89, 117 94, 117104, 117105

Abstract:

A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.

US Patent:

20050223968, Oct 13, 2005

Filed:

Mar 25, 2005

Appl. No.:

11/089814

Inventors:

John Randall - Richardson TX, US
Jingping Peng - Plano TX, US
George Skidmore - Richardson TX, US
Christof Baur - Dallas TX, US
Richard Stallcup - Little Elm TX, US
Robert Folaron - Plano TX, US

Assignee:

Zyvex Corporation - Richardson TX

International Classification:

C30B023/00
C30B025/00
C30B028/12
C30B029/08
C30B028/14

US Classification:

117094000, 117091000, 117092000, 117097000, 117104000, 117936000

Abstract:

A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.