Joan L Bosworth

US Patent:

20110102940, May 5, 2011

Filed:

Nov 2, 2009

Appl. No.:

12/610461

Inventors:

Joan K. Bosworth - San Jose CA, US
Charles M. Mate - San Jose CA, US
Ricardo Ruiz - San Bruno CA, US

Assignee:

Hitachi Global Storage Technologies Netherlands B.V. - Amsterdam

International Classification:

G11B 5/23
G11B 5/187

US Classification:

36011901, 216 22, G9B 506

Abstract:

The surfaces of hard disk drive magnetic media disks are planarized with surface-grafted polymer chains that form a monolayer-thick film of uniform, self-limiting thickness. The thickness is controlled by the molecular weight of the polymer selected. The polymer film may be swollen by a solvent vapor to fill variable width gaps in the topography. The polymer may be cross-linked in place by radiation or thermal processing.

US Patent:

20110151236, Jun 23, 2011

Filed:

Dec 18, 2009

Appl. No.:

12/641782

Inventors:

Joan K. Bosworth - San Jose CA, US
Elizabeth A. Dobisz - San Jose CA, US
Ricardo Ruiz - San Bruno CA, US
Franck D. Rose dit Rose - San Jose CA, US

International Classification:

B32B 3/26
B44C 1/22

US Classification:

4283044, 216 67, 216 83, 216 41, 977700

Abstract:

Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure comprises a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. A method, according to another embodiment, comprises forming a block copolymer layer on a substrate, inducing self assembly of the block copolymer layer, selectively degrading a block polymer from the block copolymer layer, forming a porous membrane over the block copolymer layer, and removing a portion of the block copolymer layer for defining a plurality of nanostructures extending upwardly from the substrate after forming the porous membrane over the block copolymer layer. Other systems and methods are disclosed as well.

US Patent:

20120237733, Sep 20, 2012

Filed:

May 29, 2012

Appl. No.:

13/482944

Inventors:

Joan K. Bosworth - San Jose CA, US
Elizabeth A. Dobisz - San Jose CA, US
Ricardo Ruiz - San Bruno CA, US
Franck D. Rose dit Rose - San Jose CA, US

Assignee:

HGST NETHERLANDS B.V. - Amsterdam

International Classification:

B32B 3/12

US Classification:

428159

Abstract:

Block copolymer lithography has emerged as an alternative lithographic method to achieve large-area, high-density patterns at resolutions near or beyond the limit of conventional lithographic techniques for the formation of bit patterned media and discrete track media. In one embodiment, a structure includes a plurality of nanostructures extending upwardly from a substrate and a porous membrane extending across upper ends of the plurality of nanostructures. Other systems and methods are disclosed as well.