John C Anthony

US Patent:

6777674, Aug 17, 2004

Filed:

Sep 23, 2002

Appl. No.:

10/252659

Inventors:

Thomas M. Moore - Dallas TX
John M. Anthony - Austin TX

Assignee:

Omniprobe, Inc. - Dallas TX

International Classification:

G01N 2322

US Classification:

250307, 25044211

Abstract:

We disclose a method for analyzing the composition of a microscopic particle resting on a first sample surface. The method comprises positioning a micro-manipulator probe near the particle; attaching the particle to the probe; moving the probe and the attached particle away from the first sample surface; positioning the particle on a second sample surface; and, analyzing the composition of the particle on the second sample surface by energy-dispersive X-ray analysis or detection of Auger electrons. The second surface has a reduced or non-interfering background signal during analysis relative to the background signal of the first surface. We also disclose methods for adjusting the electrostatic forces and DC potentials between the probe, the particle, and the sample surfaces to effect removal of the particle, and its transfer and relocation to the second sample surface.

US Patent:

20150329957, Nov 19, 2015

Filed:

May 15, 2015

Appl. No.:

14/713366

Inventors:

John Mark Anthony - Austin TX, US

International Classification:

C23C 14/22
C23C 14/04

Abstract:

A method of creating a localized deposition on a sample in a vacuum chamber having an ion source generating a positively-charged beam of ions and a separate source of primary radiation generating a beam of radiation. An ion beam from the ion source is directed toward the sample, and the primary radiation beam is applied to the sample to generate emitted electrons from the sample. The ion beam and the primary radiation beam are positioned so that the paths of at least some of the ions in the ion beam and the paths of at least some of the emitted electrons from the sample substantially overlap in space near the sample surface. The energy of the ions in the ion beam and the electric potential of the sample are adjusted to substantially prevent deposition of ions on the sample. The energy of the ions in the ion beam and the electric potential of the sample are adjusted so that a portion of the ions in the ion beam are neutralized by the emitted electrons from the sample, and such neutralized ions continue in their respective paths to deposit on the sample.