John David Hartley

US Patent:

6486953, Nov 26, 2002

Filed:

Jun 30, 2000

Appl. No.:

09/609293

Inventors:

Michael S. Gordon - Lincolndale NY
John G. Hartley - Fishkill NY
James D. Rockrohr - Hopewell Junction NY
Maris A. Sturans - Wappingers Falls NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

G01B 1100

US Classification:

356400

Abstract:

Motion of a block carrying a grid for backscattering portions of a pattern of charged particles incident on the grid is moved generally axially of a charged particle beam tool while the position of the block is measured, preferably to optically, with a grazing incidence laser beam or interferometer, in the axial direction for any or all of the degrees of freedom of the block. Backscatter is correlated with known grid position to correct the backscatter measurement to compensate for lateral components of motion parallel to the target plane in measurement of actual beam position at different axial locations. Telecentricity and landing angle can thus be observed to an accuracy of 0. 003 milliradians in substantially real time; permitting substantially real time adjustment thereof. The basic principles of this process and apparatus can be extended to measurement of numerical aperture and are equally applicable to probe-forming and beam projection lithography tools.

US Patent:

7080122, Jul 18, 2006

Filed:

Aug 3, 2001

Appl. No.:

09/921955

Inventors:

George Bilbrey - Lafayette CO, US
Kevin O'Connell - Denver CO, US
Eric Kirby - Boulder CO, US
John Kevin Hartley - Boulder CO, US
Andrew Michael Sautins - Boulder CO, US

Assignee:

Return Path, Inc. - New York NY

International Classification:

G06F 15/16

US Classification:

709206, 709245, 709207

Abstract:

The present invention provides various embodiments of a system and a process for updating e-mail and other forms of electronic messages via a change of address network. In one embodiment, the system includes a Sponsor Database (containing mailbox/address information utilized by a Sponsor to send information to a recipient) connected to a Network Server which receives updates of mailbox/address changes from recipients and, in certain embodiments, other Sponsors. In other embodiments, a Reconnection Manager facilitates the exchange of information between the Sponsors and the Network Server. Also, one embodiment of the process provides updated mailbox/address information to those Sponsors which a recipient has previously identified to the Network Server as being acceptable for receiving the update information. The invention also provides various embodiments by which a recipient may register change of address information with the Network Server and processes utilized by the Network Server to verify such registrations are valid.

US Patent:

6090528, Jul 18, 2000

Filed:

Oct 27, 1999

Appl. No.:

9/428601

Inventors:

Michael S. Gordon - Lincolndale NY
John G. Hartley - Fishkill NY

International Classification:

G03C 500

US Classification:

430296

Abstract:

The invention relates to the field of electron beam lithography. More particularly, the invention relates to shaped beam lithography for generating variable-shaped spots on photoresist for use in integrated circuit manufacturing processes. According to an aspect of the invention, an electron beam lithography method is provided, having the steps of generating an electron beam and directing it through a first square aperture in a first lamina, the first square aperture having a first serrated edge. According to a further aspect of the invention, the beam emanating from the first square aperture in the first lamina is focused onto a second square aperture in a second lamina having a second serrated edge. The spot generated has a subresolution edge zone induced at least in part by the first serrated edge and/or the second serrated edge.