John T Michiels

Address:

10058 Oak Br Cir, Carmel, CA 93923

Phone:

(831)6245800

VIN:

WBAWR33597PX78918

Make:

BMW

Model:

328

Year:

2007

Address:

27867 Berwick Dr, Carmel, CA 93923

Phone:

(408)6052516

VIN:

WBXPC93437WF12888

Make:

BMW

Model:

X3 3.0SI

Year:

2007

Address:

10058 Oak Br Cir, Carmel, CA 93923

Phone:

(831)6245800

VIN:

WBAVB73587VH21728

Make:

BMW

Model:

335

Year:

2007

US Patent:

6358763, Mar 19, 2002

Filed:

Apr 10, 2000

Appl. No.:

09/545978

Inventors:

David H. Wells - Boise ID
Aaron R. Wilson - Boise ID
John J. Michiels - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

H01L 2100

US Classification:

438 20, 427180, 427184, 427194, 427 77, 427355, 427359, 216 11

Abstract:

Methods of forming mask patterns and methods of forming field emitter tip masks are described. In one embodiment a first surface is provided over which a mask pattern is to be formed. A mixture comprising mask particles is applied to a second surface comprising material joined with the first layer. The mixture, as applied, leaves an undesirable distribution of mask particles over the first surface. After application of the mixture to the second surface, the mask particles are laterally distributed over the first surface, into a desirable distribution by placing a particle-dispersing structure directly into the mixture on the second surface and moving the particle-dispersing structure laterally through the mixture on the second surface. In another embodiment, a mixture is formed on the substrates second surface and includes a liquid component and a plurality of solid mask-forming components. A mixture-thinning structure is positioned over the substrate and separated from the second surface thereof only by the mixture.

US Patent:

6439115, Aug 27, 2002

Filed:

Aug 30, 2000

Appl. No.:

09/650840

Inventors:

John M. Michiels - Boise ID
Darryl M. Stansbury - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

B41M 112

US Classification:

101129, 101123

Abstract:

Method for screen printing a continuous structure on a substrate wherein the screen printed structure extends from at least a first level to at least a second level. The disclosed method is particularly suitable for the fabrication of microelectronic devices and components thereof including the fabrication of field emission display devices. Preferably, a print screen of a preferred thickness having a preconfigured print pattern formed therethrough, in combination with a squeegee having a hardness within a preferred range, are used to force a screen printable substance onto a substrate while maintaining a portion of the print screen within a preferred reference angle. The resulting screen printed structure extends from at least one lower level to at least one upper level in a continuous âuphillâ manner. The disclosed method is particularly suitable for forming continuous electrically conductive structures or circuit traces extending from a lower level of a substrate, such as an anode plate of an FED device, up onto at least one second surface vertically distanced from the substrate. The electrically conductive structure may optionally terminate into a specifically configured contact pad for accommodating complimentary contacting structures located on a mating component, such as a cathode plate of an FED device.

US Patent:

6458515, Oct 1, 2002

Filed:

Sep 5, 2001

Appl. No.:

09/947648

Inventors:

John Michiels - Boise ID
David Wells - Boise ID
Eric J. Knappenberger - Meridian ID
James J. Alwan - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G03C 500

US Classification:

430313, 430311, 430323

Abstract:

The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

US Patent:

6537728, Mar 25, 2003

Filed:

Sep 5, 2001

Appl. No.:

09/947647

Inventors:

John Michiels - Boise ID
David Wells - Boise ID
Eric J. Knappenberger - Meridian ID
James J. Alwan - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G03C 176

US Classification:

4302701, 430 5, 430949

Abstract:

The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

US Patent:

6573023, Jun 3, 2003

Filed:

Dec 10, 1999

Appl. No.:

09/458758

Inventors:

John Michiels - Boise ID
David Wells - Boise ID
Eric J. Knappenberger - Meridian ID
James J. Alwan - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G03C 500

US Classification:

4302701, 430 5, 430308, 430313, 430322, 430330

Abstract:

The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

US Patent:

6586144, Jul 1, 2003

Filed:

Mar 27, 2001

Appl. No.:

09/819165

Inventors:

John Michiels - Boise ID
David Wells - Boise ID
Eric J. Knappenberger - Meridian ID
James J. Alwan - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G03F 900

US Classification:

430 5, 430323, 430313, 430949

Abstract:

The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

US Patent:

6682873, Jan 27, 2004

Filed:

Sep 23, 2002

Appl. No.:

10/253550

Inventors:

John Michiels - Boise ID
David Wells - Boise ID
Eric J. Knappenberger - Meridian ID
James J. Alwan - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

G03C 500

US Classification:

430313, 430 5, 430311, 430323

Abstract:

The present invention includes structures, lithographic mask forming solutions, mask forming methods, field emission display emitter mask forming methods, and methods of forming plural field emission display emitters. One aspect of the present invention provides a mask forming method including forming a masking layer over a surface of a substrate; screen printing plural masking particles over a surface of the masking layer; and removing at least portions of the masking layer using the masking particles as a mask. Another aspect of the present invention provides a method of forming plural field emission display emitters. This method includes forming a masking layer over an emitter substrate; screen printing a plurality of masking particles over the masking layer; removing portions of the masking layer intermediate the screen printed masking particles to form a plurality of masking elements; removing the masking particles from the masking elements; and removing portions of the emitter substrate to form plural emitters.

US Patent:

6736058, May 18, 2004

Filed:

May 21, 2002

Appl. No.:

10/152257

Inventors:

John M. Michiels - Boise ID
Darryl M. Stansbury - Boise ID

Assignee:

Micron Technology, Inc. - Boise ID

International Classification:

B41M 112

US Classification:

101129, 101123

Abstract:

Method for screen printing a continuous structure on a substrate wherein the screen printed structure extends from at least a first level to at least a second level. The disclosed method is particularly suitable for the fabrication of microelectronic devices and components thereof including the fabrication of field emission display devices. Preferably, a print screen of a preferred thickness having a preconfigured print pattern formed therethrough, in combination with a squeegee having a hardness within a preferred range, are used to force a screen printable substance onto a substrate while maintaining a portion of the print screen within a preferred reference angle. The resulting screen printed structure extends from at least one lower level to at least one upper level in a continuous âuphillâ manner. The disclosed method is particularly suitable for forming continuous electrically conductive structures or circuit traces extending from a lower level of a substrate, such as an anode plate of an FED device, up onto at least one second surface vertically distanced from the substrate. The electrically conductive structure may optionally terminate into a specifically configured contact pad for accommodating complementary contacting structures located on a mating component, such as a cathode plate of an FED device.