John A Parette

US Patent:

57664951, Jun 16, 1998

Filed:

Mar 13, 1997

Appl. No.:

8/816661

Inventors:

John Joseph Parette - Jessup PA

Assignee:

WEA Manufacturing Inc. - Olyphant PA

International Classification:

B44C 122

US Classification:

216 54

Abstract:

Generic and specific artwork is imparted to plastic discs such as CDs, CD ROMs, and DVDs (digital video discs) by exposing a layer of photoresist material on a forming member, which already contains generic artwork, to light from an original image of specific artwork. The material of the photoresist layer is exposed to different depths by different intensity light from different specific image regions. Where the image is dark, the exposure is to relatively shallow, random depths. Where the image is light, the full thickness of the photoresist layer is exposed. Development of the photoresist layer removes the exposed photoresist material. The surface features of the developed photoresist layer and any uncovered forming member surface are transferred to a second forming member used in forming a surface of the plastic disc, thereby visibly embossing both generic and specific artwork in the disc.

US Patent:

59586516, Sep 28, 1999

Filed:

Sep 18, 1996

Appl. No.:

8/714302

Inventors:

Peter van Hoof - Moosic PA
John Joseph Parette - Jessup PA
John F. Pierzga - Forest City PA

Assignee:

WEA Manufacturing Inc. - Olyphant PA

International Classification:

G11B 726
G11B 724
G03F 700

US Classification:

430292

Abstract:

Artwork is imparted to plastic discs such as CDs, CD ROMs, and DVDs (digital video discs) by exposing a layer of photoresist material on a substrate to light from an original image of the artwork. The material of the photoresist layer is exposed to different depths by different intensity light from different image regions. Where the image is dark, the exposure is to relatively shallow, random depths. Where the image is light, the full thickness of the photoresist layer is exposed. Development of the photoresist layer removes the exposed photoresist material. The surface features of the developed photoresist layer and any uncovered substrate are transferred to a member used in forming a surface of the plastic disc, thereby visibly embossing the image in the disc.