John H Stover

US Patent:

6509965, Jan 21, 2003

Filed:

Jul 17, 2001

Appl. No.:

09/906062

Inventors:

Michael E. Fossey - Newbury Park CA
John C. Stover - Charlotte NC
Lee D. Clementi - Lake Wylie SC

Assignee:

ADE Optical Systems Corporation - Charlotte NC

International Classification:

G01N 2100

US Classification:

3562372, 356343, 356364, 3562374

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

20030071992, Apr 17, 2003

Filed:

Nov 22, 2002

Appl. No.:

10/301677

Inventors:

Michael Fossey - Newbury Park CA, US
John Stover - Charlotte NC, US
Lee Clementi - Lake Wvlie SC, US

Assignee:

ADE Optical Systems Corporation, a Massachusetts corporation

International Classification:

G01N021/00

US Classification:

356/239700

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

20040085533, May 6, 2004

Filed:

Jun 24, 2003

Appl. No.:

10/601698

Inventors:

Michael Fossey - Newbury Park CA, US
John Stover - Charlotte NC, US
Lee Clementi - Lake Wylie SC, US

Assignee:

ADE Optical Systems Corporation

International Classification:

G01N021/00

US Classification:

356/239700

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides or detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

20130258323, Oct 3, 2013

Filed:

Dec 23, 2012

Appl. No.:

13/726154

Inventors:

William P. Kuhn - Tucson AZ, US
John C. Stover - Tucson AZ, US
Robert S. LeCompte - Tucson AZ, US

International Classification:

G01B 11/26

US Classification:

356138

Abstract:

A device and method for subaperture stray light detection and diagnosis in an optical system. A test light beam is generated with a width whose cross sectional area is less than the cross sectional area of a system aperture. Stray light is detected at a system detection surface. Based on the stray light and the location and direction angles of the light beam, potential paths that light may have taken to arrive at the detection surface are determined so as to identify physical features of the optical system that may have produced the stray light. A testing device comprises a test light beam source, preferably including a beam width magnifier, whereby the cross sectional area of the test light beam is made less than the cross sectional area of the system aperture. A relative lateral positioning stage and an angular beam directing stage launch the test light beam into the aperture at a selected position and selected directional angles. A detector and a data processing system produce a data set relating the stray light to the location and directional angles of the test light beam. A light trap and complementary test light beam delivery system are also provided.

US Patent:

61185256, Sep 12, 2000

Filed:

Oct 27, 1997

Appl. No.:

8/958230

Inventors:

Michael E. Fossey - Newbury Park CA
John C. Stover - Charlotte NC
Lee D. Clementi - Lake Wylie SC

Assignee:

ADE Optical Systems Corporation - Charlotte NC

International Classification:

G01N 2100

US Classification:

3562372

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

20140362377, Dec 11, 2014

Filed:

May 30, 2014

Appl. No.:

14/291281

Inventors:

- Tucson AZ, US
John Clyde Stover - Tucson AZ, US

Assignee:

ScatterMaster LLC - Tucson AZ

International Classification:

G01N 21/47
G01N 21/49

US Classification:

356343, 356446

Abstract:

A hemispherical scanning optical scatterometer and method for its use for measuring scattered radiation, with a reflected scatter measurement laser, and/or a transmitted scatter measurement laser, an array of optical detectors, a computer controlled system to rotate the array of optical detectors, an electronic system, a computer interface and a computer for processing the signal.