John R Stover

US Patent:

6509965, Jan 21, 2003

Filed:

Jul 17, 2001

Appl. No.:

09/906062

Inventors:

Michael E. Fossey - Newbury Park CA
John C. Stover - Charlotte NC
Lee D. Clementi - Lake Wylie SC

Assignee:

ADE Optical Systems Corporation - Charlotte NC

International Classification:

G01N 2100

US Classification:

3562372, 356343, 356364, 3562374

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

20030071992, Apr 17, 2003

Filed:

Nov 22, 2002

Appl. No.:

10/301677

Inventors:

Michael Fossey - Newbury Park CA, US
John Stover - Charlotte NC, US
Lee Clementi - Lake Wvlie SC, US

Assignee:

ADE Optical Systems Corporation, a Massachusetts corporation

International Classification:

G01N021/00

US Classification:

356/239700

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

20040085533, May 6, 2004

Filed:

Jun 24, 2003

Appl. No.:

10/601698

Inventors:

Michael Fossey - Newbury Park CA, US
John Stover - Charlotte NC, US
Lee Clementi - Lake Wylie SC, US

Assignee:

ADE Optical Systems Corporation

International Classification:

G01N021/00

US Classification:

356/239700

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides or detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.

US Patent:

61185256, Sep 12, 2000

Filed:

Oct 27, 1997

Appl. No.:

8/958230

Inventors:

Michael E. Fossey - Newbury Park CA
John C. Stover - Charlotte NC
Lee D. Clementi - Lake Wylie SC

Assignee:

ADE Optical Systems Corporation - Charlotte NC

International Classification:

G01N 2100

US Classification:

3562372

Abstract:

A surface inspection system and method is provided which detects defects such as particles or pits on the surface of a workpiece, such as a silicon wafer, and also distinguishes between pit defects and particle defects. The surface inspection system comprises an inspection station for receiving a workpiece and a scanner positioned and arranged to scan a surface of the workpiece at the inspection station. The scanner includes a light source arranged to project a beam of P-polarized light and a scanner positioned to scan the P-polarized light beam across the surface of the workpiece. The system further provides for detecting differences in the angular distribution of the light scattered from the workpiece and for distinguishing particle defects from pit defects based upon these differences.