John B Webb

US Patent:

6709661, Mar 23, 2004

Filed:

Feb 12, 1997

Appl. No.:

08/798841

Inventors:

Steven G. Reed - Bellevue WA
Antonio Campos-Neto - Bainbridge Island WA
John R. Webb - Everett WA
Davin C. Dillon - Redmond WA
Yasir A. W. Skeiky - Seattle WA

Assignee:

Corixa Corporation - Seattle WA

International Classification:

A61K 39008

US Classification:

4242691, 4241841, 424 852, 4241911, 4241921, 4242651, 514 12, 514 44, 514 2, 530300, 530350, 536 231, 536 236

Abstract:

Compositions and methods for preventing, treating and detecting leishmaniasis and stimulating immune responses in patients are disclosed. The compounds provided include polypeptides that contain at least an immunogenic portion of one or more Leishmania antigens, or a variant thereof. Vaccines and pharmaceutical compositions comprising such polypeptides, or DNA molecules encoding such polypeptides, are also provided and may be used, for example, for the prevention and therapy of leishmaniasis, as well as for the detection of Leishmania infection.

US Patent:

20100075488, Mar 25, 2010

Filed:

Sep 15, 2009

Appl. No.:

12/560073

Inventors:

Richard O. Collins - Santa Clara CA, US
Nyi O. Myo - San Jose CA, US
Kevin J. Bautista - San Jose CA, US
John S. Webb - Sunnyvale CA, US
Errol C. Sanchez - Tracy CA, US
Yi-Chiau Huang - Fremont CA, US
Kailash Kiran Patalay - Santa Clara CA, US
Zhi Yuan Zhou - Union City CA, US
Wilson Yu - Fremont CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

H01L 21/20
C23C 16/458

US Classification:

438507, 118719, 118730, 438584, 257E2109

Abstract:

An apparatus for processing a substrate, comprising a processing chamber and a substrate support and lift pin assembly disposed within the chamber. The substrate support and lift pin assembly are coupled to a lift mechanism that controls positioning of the substrate support and the lift pins and provides rotation for the substrate support. The lift mechanism includes at least one sensor capable of generating a signal when clearance between the substrate support and the lift pins allows rotation of the substrate support to begin. The substrate support capable of concurrent axial motion and rotation may be used in a processing chamber comprising multiple processing zones separated by edge rings. Substrates may be subjected to successive or cyclical processes by moving between the multiple processing zones.

US Patent:

20120103263, May 3, 2012

Filed:

Sep 30, 2011

Appl. No.:

13/250906

Inventors:

NYI O. MYO - San Jose CA, US
John S. Webb - Sunnyvale CA, US
Masato Ishii - Sunnyvale CA, US
Xuebin Li - Santa Clara CA, US
Zhiyuan Ye - San Jose CA, US
Ali Zojaji - Santa Clara CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

C23C 16/455
C23C 16/458

US Classification:

118728, 118715

Abstract:

Embodiments of the present invention generally relates to apparatus for use in film depositions. The apparatus generally include pre-heat rings adapted to be positioned in a processing chamber. In one embodiment, a pre-heat ring includes a ring having an inner edge and an outer edge. The outer edge has a constant radius. The inner edge is oblong-shaped and may have a first portion having a constant radius measured from a center of a circle defined by an outer circumference of the ring. A second portion may have a constant radius measured from a location other than the center of the outer circumference. In another embodiment, a processing chamber includes a pre-heat ring positioned around the periphery of a substrate support. The pre-heat ring includes an inner edge having a first portion, a second portion, and one or more linear portions positioned between the first portion and the second portion.