Jonathan D Peak

US Patent:

20170016715, Jan 19, 2017

Filed:

Jul 11, 2016

Appl. No.:

15/207261

Inventors:

- Milpitas CA, US
John Allgair - Tigard OR, US
Jonathan Peak - Hillsboro OR, US
Timothy Andrew Johnson - Tigard OR, US

International Classification:

G01B 11/24

Abstract:

An interferometric metrology device characterizes a surface topography of a sample at different length scales by combining the interferometric data into blocks of different length scales or by filtering the interferometric data at different length scales and then determining statistical moments or surface properties of the surface topography at the different length scales. The interferometric metrology device determines a best focus position for a processing tool based on different length scales and/or based on weighting functions that are based on the structure-dependent focus budget and a variable local topography. Additionally, the topography data may be used by itself or combined with design data, design simulation depth-of-focus data and lithography scanner focus data to define regions of interest for additional characterization with a different metrology device.