Florida Heart & Vascular Care PLLCFlorida Heart & Vascular Care 180 John F Kennedy Dr STE 320, Lake Worth, FL 33462 (561)5484900 (phone), (561)5484902 (fax)
Education:
Medical School University of Miami, Miller School of Medicine Graduated: 1968
Procedures:
Aortic Aneurysm Repair Thoracic Aortic Aneurysm Repair Coronary Artery Bypass Heart Valve Procedures Removal Procedures on the Lungs and Pleura Thoracoscopy
Conditions:
Congenital Anomalies of the Heart Lung Cancer
Languages:
English Spanish
Description:
Dr. Lester III graduated from the University of Miami, Miller School of Medicine in 1968. He works in Atlantis, FL and specializes in Congenital Cardiac Surgery (Thoracic Surgery). Dr. Lester III is affiliated with John F Kennedy Medical Center.
Name / Title
Company / Classification
Phones & Addresses
Joseph Lester Product Manager
Metropolitan Insurance & Annuity Co Insurance Agents, Brokers, and Service
Richard S. Speer - Concord MA Joseph E. Lester - Lincoln MA
Assignee:
Osram Sylvania Inc. - Danvers MA
International Classification:
H01J 162
US Classification:
313490, 313492, 313493, 313483
Abstract:
An amalgam assembly for a fluorescent lamp includes a glass exhaust tubulation extending toward a base portion of the lamp, the tubulation being closed at an end thereof adjacent the lamp base portion, and a retaining structure disposed in the tubulation and retained by a pinched portion of the tubulation. A mercury amalgam body is disposed in the tubulation between the retaining structure and the tubulation closed end. The amalgam body includes lithium for wetting internal surfaces of the glass tubulation to cause the amalgam to adhere to the tubulation internal surfaces when the amalgam body is liquidized, and to thereby prevent the amalgam from flowing past the retaining structure and into the lamp envelope.
Incandescent Lamp That Emits Infrared Light And A Method Of Making The Lamp
Jeffrey T. Neil - North Reading MA, US Victor E. Perez - Manchester NH, US Joseph E. Lester - Lincoln MA, US
Assignee:
Osram Sylvania Inc. - Danvers MA
International Classification:
H01J 17/18 H01J 61/36
US Classification:
313623, 313484, 313493, 313567, 313578, 313238
Abstract:
An incandescent lamp that emits infrared light and a method of making the lamp includes a filament assembly inside a polycrystalline aluminum oxide (PCA) envelope, where the filament assembly preferably has a coiled tungsten filament, solid metal ends of tungsten or molybdenum attached to the coiled tungsten filament, and leads at distal ends of the solid metal ends. End caps are attached to ends of the envelope and have openings through which a respective one of the leads extends, where the leads are each made of an electrically conductive material having a coefficient of thermal expansion compatible with the end caps, such as niobium. The leads are attached to the end caps with glass-ceramic sealing frits. The end caps and sealing frits seal a suitable gas inside the envelope.
Method For Making A Tantala/Silica Interference Using Heat Treatment
Hongwen Li - Pittsford NY Gautam Bandyopadhyay - Acton MA Keith A. Klinedinst - Marlboro MA Joseph E. Lester - Lincoln MA
Assignee:
Osram Sylvania Inc. - Danvers MA
International Classification:
B05D 512 B05D 302 C23C 1606
US Classification:
427107
Abstract:
A method for making a tantala/silica interference filter on a vitreous substrate, which filter retains integrity at temperatures in excess of 600. degree. C. , includes the steps of depositing by low pressure chemical vapor deposition a first coating of tantala/silica on the substrate, heat treating the first coating, and depositing by low pressure chemical vapor deposition a second coating of tantala/silica, the first and second coatings in combination providing a tantala/silica interference filter with a thickness of at least 3. 5 microns on the vitreous substrate. There is further presented an electric lamp having an envelope and an interference filter applied thereto, in accordance with the above method.
Howard McKinzie - Framingham MA Mark S. Wrighton - Medford MA Joseph Lester - Acton MA
Assignee:
GTE Laboratories Incorporated - Waltham MA
International Classification:
H01M 630 H01M 636
US Classification:
429111
Abstract:
A photochemical energy storage system includes at least one electrolytic solution containing a reduction-oxidation couple, one species of which can be stored in a second phase. The device includes a charging system and an energy delivery system. The charging system includes an n-or p-type photosensitive electrode at which, under illumination, an oxidation or reduction reaction occurs. In the charging cycle, one species is oxidized while the other is reduced, and one of these products is stored in a phase other than the phase in which the reaction occurs. The energy delivery system transfers electrons to or from the high energy product on demand for delivery through an electrical load to an electrode at which the original reactants can be reconstituted.
Keith A. Klinedinst - Marlborough MA Joseph E. Lester - Lincoln MA
Assignee:
GTE Products Corporation - Danvers MA
International Classification:
C23C 1600
US Classification:
4272481
Abstract:
An apparatus and method for the low temperature deposition of SiO. sub. 2 in a low pressure chemical vapor deposition system is disclosed. The apparatus makes use of a prereactor to form an activated form of diacetoxyditertiarybutoxysilane (DADBS) from which SiO. sub. 2 is deposited. The prereactor may be positioned upstream of an SiO. sub. 2 deposition reactor or may be incorporated into the front end thereof.
Sulfur Dioxide Reduction Process Utilizing Catalysts With Spinel Structure
Howard McKinzie - Framingham MA Joseph E. Lester - Acton MA Frank C. Palilla - Framingham MA
Assignee:
GTE Laboratories Incorporated - Waltham MA
International Classification:
C01B 1704
US Classification:
423570
Abstract:
A catalytic process for the reduction to elemental sulfur of the sulfur dioxide contained in gas streams using a reducing gas such as hydrogen, or preferably carbon monoxide, in a reactor charged with a material represented by the general formula M. sup. II M. sub. 2. sup. III O. sub. 4 crystallized in the spinel structure wherein M. sup. II is a divalent metal and M. sup. III is a trivalent metal from the first transition period of the Periodic Table of the Elements, or derivatives of the materials of the above formula resulting from pretreatment with hydrogen or, preferably carbon monoxide, and/or exposure to the sulfur dioxide-containing gas stream.
Joseph E. Lester - Lincoln MA Robert C. Folweiler - Bedford MA
Assignee:
GTE Laboratories Incorporated - Waltham MA
International Classification:
C01B 719 C01B 708 C01G 23047 C01G 2502 C01G 2702
US Classification:
423483
Abstract:
A method for controlling the water present in hydrogen fluoride is described which effectively removes all the water contained in the hydrogen fluoride solution to form other compounds that either have extremely low vapor pressure or are acceptable in a process such as chemical vapor purification. The method involves as one of the steps the contacting of a reactive metal halide with a hydrogen fluoride containing water. The metal halide reacts with the water contained in the hydrogen fluoride solution yielding a metal oxide, hydrogen halide, and anhydrous hydrogen fluoride. The metal oxide is a solid, with low vapor pressure, thereby effectively removing oxygen-bearing species from the hydrogen fluoride.
Apparatus For The Controlled Delivery Of Vaporized Chemical Precursor To An Lpcvd Reactor
Keith A. Klinedinst - Marlborough MA Joseph E. Lester - Lincoln MA
Assignee:
Osram Sylvania Inc. - Danvers MA
International Classification:
C23C 1600
US Classification:
118715
Abstract:
An apparatus and method for the controlled delivery of vaporized chemical precursor to an LPCVD reactor is disclosed. A liquid flow controller is closely coupled with a highly efficient liquid vaporizer. The liquid flow controller, which contains no moving parts or polymeric seals, employs as a basic element an efficient gas-liquid separator downstream of the flow control element which assures that an uninterrupted constant velocity flow of liquid enters the high-temperature zone of the vaporizer. When the output of the vaporized-precursor delivery system is linked with the gas inlet of an LPCVD reactor, the very precise vapor delivery rates obtained translate into very precisely controlled thin film deposition rates.