Joseph S Stach

US Patent:

56546793, Aug 5, 1997

Filed:

Jun 13, 1996

Appl. No.:

8/662886

Inventors:

Anton Mavretic - Marlton NJ
Andrew Ciszek - Maple Shade NJ
Joseph Stach - Medford NJ

Assignee:

RF Power Products, Inc. - Voorhees NJ

International Classification:

H03H 740

US Classification:

333 173

Abstract:

An apparatus for matching the variable impedance of a load with the fixed impedance of a radio frequency (RF) power generator to provide maximum power transfer. The impedance matching network further allows an RF power generator to vary the frequency of the voltage applied to a load, e. g. , a plasma chamber as may be utilized in semiconductor or flat panel plasma display manufacturing processes. The impedance matching network further utilizes fixed solid state components to adjust the impedance of the attached load to provide maximum power transfer between the generator and the load. A parallel switched capacitor network is controlled by an electrical switching means such as PIN diodes to turn fixed capacitors on or off. A means for varying the frequency of the applied voltage is used to match the impedance of the load with the impedance of the RF power generator within milliseconds.

US Patent:

45183490, May 21, 1985

Filed:

Dec 1, 1983

Appl. No.:

6/557232

Inventors:

Richard E. Tressler - Julian PA
Joseph Stach - State College PA
Roger L. Baeten - State College PA

Assignee:

Better Semiconductor Processes (BSP) - State College PA

International Classification:

F27D 300
F27D 500
F27B 904
F27B 914

US Classification:

432 11

Abstract:

An improved semiconductor wafer handling system completely eliminates the need for boats, sleds, paddles, wheeled carriers, etc. , customarily employed in transporting wafers during heat processing through the use of a plurality of rigid, polished cantilevered rods having a multiplicity of spaced slots for cooperatively holding wafers in an upright position. The system provides a means for achieving higher production yields of such semiconductor elements by generating fewer contaminating particles and through less exposure to ambient environment.