Kathleen B Gabriel

US Patent:

49592939, Sep 25, 1990

Filed:

Oct 28, 1988

Appl. No.:

7/264335

Inventors:

George Schwartzkopf - Franklin Township, Somerset County NJ
John B. Covington - Bethlehem PA
Kathleen B. Gabriel - Bethlehem PA

Assignee:

J. T. Baker, Inc. - Phillipsburg NJ

International Classification:

G03F 7004
G03F 7022
G03C 154

US Classification:

430189

Abstract:

2-diazo-1-ones are useful deep UV photoresist solubility modification agents exhibiting improved photosensitivity allowing shorter deep UV exposure times to achieve the same extent of photoreaction as with prior art solubility modification agents. The 2-diazo-1-one solubility modification agents when used as photoactive solubility modification components in photoresist compositions permit the photoresist compositions to act as either positive or negative photoresist compositions depending upon the developer employed, namely, as a positive resist when a metal ion containing developer is employed and as a negative resist when a metal ion free developer is employed.