Kathleen Te O'Connell

US Patent:

20130337179, Dec 19, 2013

Filed:

Feb 25, 2013

Appl. No.:

13/776496

Inventors:

Rohm and Haas Electronic Materials LLC - , US
Jibin Sun - San Mateo CA, US
Peter Trefonas - Medway MA, US
Kathleen M. O'Connell - Cumberland RI, US

Assignee:

Rohm and Haas Electronic Materials LLC - Marlborough MA

International Classification:

H01L 21/02
H01L 21/027
C08K 5/00

US Classification:

4273722, 524357, 524108, 524382, 556 54, 549210

Abstract:

The invention provides a composition comprising at least the following A and B:

US Patent:

20170362459, Dec 21, 2017

Filed:

Dec 7, 2015

Appl. No.:

15/534094

Inventors:

- Marlborough MA, US
- Midland MI, US
Shih-Wei Chang - Natick MA, US
John W. Lyons - Midland MI, US
Kathleen M. O'Connell - Cumberland RI, US
Weijun Zhou - Sugar Land TX, US

International Classification:

C09D 139/08
C08K 5/095
C08K 5/00
C08K 5/06
G02F 1/13363
C09D 133/12

Abstract:

A polymeric material having a negative photoelastic constant. The polymeric material comprises: (a) a polymer comprising polymerized units of 2-vinylpyridine, 4-vinylpyridine, methyl methacrylate or a combination thereof; (b) a C-Caliphatic polycyclic compound; and (c) an organic compound having a boiling point of at least 200 C.

US Patent:

20160133864, May 12, 2016

Filed:

Oct 14, 2015

Appl. No.:

14/882992

Inventors:

- Marlborough MA, US
- Chungcheongnam-do, KR
Christopher D. Gilmore - Watertown MA, US
Deyan Wang - Hudson MA, US
Kathleen M. O'Connell - Cumberland RI, US
Moo-Young Lee - Seongnam-si, KR

International Classification:

H01L 51/00
H01L 27/32
H01L 51/56

Abstract:

A method of manufacturing a display device is provided which uses a sacrificial layer interposed between a carrier and a display device substrate.

US Patent:

20150291829, Oct 15, 2015

Filed:

Jun 25, 2015

Appl. No.:

14/750180

Inventors:

- Marlborough MA, US
Jibin Sun - San Mateo CA, US
Peter Trefonas - Medway MA, US
Kathleen M. O'Connell - Cumberland RI, US

International Classification:

C09D 133/14

Abstract:

The invention provides a composition comprising at least the following A and B:

US Patent:

20150210793, Jul 30, 2015

Filed:

Dec 31, 2014

Appl. No.:

14/588385

Inventors:

- Marlborough MA, US
- Midland MI, US
Christopher D. GILMORE - Watertown MA, US
Jieqian ZHANG - Southborough MA, US
Phillip D. HUSTAD - Natick MA, US
Peter TREFONAS, III - Medway US, US
Kathleen M. O'Connell - Cumberland RI, US

International Classification:

C08F 212/08
C08F 212/12
C09D 133/10
C09D 133/12
C09D 125/16
C08F 220/18
C09D 125/14

Abstract:

A crosslinkable polymer comprising: a first unit of the following general formula (I-A) or (I-B):wherein: P is a polymerizable functional group; L is a single bond or an m+1-valent linking group; Xis a monovalent electron donating group; Xis a divalent electron donating group; Arand Arare trivalent and divalent aryl groups, respectively, and carbon atoms of the cyclobutene ring are bonded to adjacent carbon atoms on the same aromatic ring of Aror Ar; m and n are each an integer of 1 or more; and each Ris independently a monovalent group; and a second unit chosen from general formulae (III) and (IV):wherein Ris chosen from hydrogen, fluorine, C-Calkyl and C-Cfluoroalkyl, Ris chosen from optionally substituted Cto Calkyl, and Aris an optionally substituted aryl group. Underlayer compositions comprise the crosslinkable polymer and a solvent. The crosslinkable polymers and underlayer compositions find particular applicability in the manufacture of semiconductor devices or data storage devices for the formation of high resolution patterns.