Kathleen M Russell

US Patent:

8620895, Dec 31, 2013

Filed:

Nov 21, 2011

Appl. No.:

13/301647

Inventors:

David F. Lish - Burlingame CA, US
Memet Firat Ozkan - San Diego CA, US
Alan M. Poulin - San Diego CA, US
Jason K. De Mello - Poway CA, US
Johan A. Johansson - Tucson AZ, US
Kathleen P. Russell - San Diego CA, US

Assignee:

Intuit Inc. - Mountain View CA

International Classification:

G06F 17/30

US Classification:

707706, 707710, 707763, 707769

Abstract:

During a data-access technique, a query that is associated with an organizational accounting code is used to generate a set of queries for business databases. In particular, when generating the set of queries, the organizational accounting code is mapped to a set of database-specific accounting codes using a reclassification list. After receiving answers to the set of queries (which are associated with the set of database-specific accounting codes) from the business databases, the answers are presented to the user. In this way, the user can access the business databases, which may have incompatible database-specific accounting codes, from a single environment with little or no additional effort or expense.

US Patent:

56481756, Jul 15, 1997

Filed:

Feb 14, 1996

Appl. No.:

8/601558

Inventors:

Kathleen Russell - Santa Clara CA
Stuardo Robles - Sunnyvale CA
Bang C. Nguyen - Fremont CA
Visweswaren Sivaramakrishnan - Cupertino CA

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B32B 900
B05C 1100

US Classification:

4284723

Abstract:

A method of and apparatus for depositing a silicon oxide layer onto a wafer or substrate is provided. The present method includes introducing into a processing chamber a process gas including silicon, oxygen, boron, phosphorus and germanium to form a germanium doped BPSG oxide layer having a reflow temperature of less than 800. degree. C. Preferred embodiments of the present method are performed in either a subatmospheric CVD or a plasma enhanced CVD processing apparatus.